3-(2-hydroxyethoxy)-1-adamantyl acrylate | 928833-09-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-(2-hydroxyethoxy)-1-adamantyl acrylate
• 英文别名: [3-(2-Hydroxyethoxy)-1-adamantyl] prop-2-enoate
• CAS: 928833-09-4
• 化学式: C₁₅H₂₂O₄
• 分子量: 266.337
• InChiKey: LVVOGOXTICKZFW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  19
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  3-methanesulfonyloxy-1-adamantyl acrylate 、 乙二醇 在 4-甲氧基苯酚 、 三乙胺 水 作用下， 反应 3.0h， 以92.8%的产率得到3-(2-hydroxyethoxy)-1-adamantyl acrylate
  参考文献：
  名称：

  WO2007/29442

  摘要：

  公开号：

文献信息

• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF
  申请人：International Business Machines Corporation

  公开号：US20150050601A1

  公开（公告）日：2015-02-19

  The present invention relates to a developable bottom antireflective coating (BARC) composition and a pattern forming method using the BARC composition. The BARC composition includes a first polymer having a first carboxylic acid moiety, a hydroxy-containing alicyclic moiety, and a first chromophore moiety; a second polymer having a second carboxylic acid moiety, a hydroxy-containing acyclic moiety, and a second chromophore moiety; a crosslinking agent; and a radiation sensitive acid generator. The first and second chromophore moieties each absorb light at a wavelength from 100 nm to 400 nm. In the patterning forming method, a photoresist layer is formed over a BARC layer of the BARC composition. After exposure, unexposed regions of the photoresist layer and the BARC layer are selectively removed by a developer to form a patterned structure in the photoresist layer. The BARC composition and the pattern forming method are especially useful for implanting levels.

  本发明涉及一种可开发的底部抗反射涂层（BARC）组合物及使用该BARC组合物的图案形成方法。该BARC组合物包括第一聚合物，其具有第一羧基酸基团，含羟基的脂环族基团和第一色团基团；第二聚合物，其具有第二羧基酸基团，含羟基的非环族基团和第二色团基团；交联剂；以及辐射敏感的酸发生剂。第一和第二色团基团吸收100纳米至400纳米波长的光线。在图案形成方法中，先形成一层BARC组合物的BARC层，再在其上形成一层光阻层。经曝光后，通过显影剂选择性地去除光阻层和BARC层的未曝光区域，形成光阻层中的图案结构。该BARC组合物和图案形成方法特别适用于植入级别。
• POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20090162785A1

  公开（公告）日：2009-06-25

  There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof. The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below. (wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R 0 represents an alkyl group containing a hydroxyl group.) Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.

  本发明提供了一种聚合物化合物，可以形成具有优异分辨率的抗蚀图案，以及包含该聚合物化合物的负型抗蚀组合物和其制备方法。本发明是一种聚合物化合物，其中包含下式所示的通式（a0-1）所代表的结构单元（a0）。（其中，R代表氢原子、卤素原子、烷基或卤代烷基；R0代表含有羟基的烷基。）此外，本发明还提供了一种负型抗蚀组合物，包括：碱溶性树脂组分（A）、在曝光时生成酸的酸发生器组分（B）和交联剂（C），其中碱溶性树脂组分（A）含有具有上述通式（a0-1）所代表的结构单元（a0）的聚合物化合物（A1）。
• POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Iwashita Jun

  公开号：US20100081080A1

  公开（公告）日：2010-04-01

  A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R 1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R 2 and R 3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R 2 and R 3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R 4 and R 5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.
• POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：IKEDA Norihiko

  公开号：US20100239981A1

  公开（公告）日：2010-09-23

  A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R 0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and R 3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R 3 and R 3 bonding to each other together with a carbon atom.
• US7820360B2
  申请人：——

  公开号：US7820360B2

  公开（公告）日：2010-10-26