POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
申请人:Iwashita Jun
公开号:US20090162785A1
公开(公告)日:2009-06-25
There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof.
The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below.
(wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R
0
represents an alkyl group containing a hydroxyl group.)
Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.
本发明提供了一种聚合物化合物,可以形成具有优异分辨率的抗蚀图案,以及包含该聚合物化合物的负型抗蚀组合物和其制备方法。本发明是一种聚合物化合物,其中包含下式所示的通式(a0-1)所代表的结构单元(a0)。(其中,R代表氢原子、卤素原子、烷基或卤代烷基;R0代表含有羟基的烷基。)此外,本发明还提供了一种负型抗蚀组合物,包括:碱溶性树脂组分(A)、在曝光时生成酸的酸发生器组分(B)和交联剂(C),其中碱溶性树脂组分(A)含有具有上述通式(a0-1)所代表的结构单元(a0)的聚合物化合物(A1)。