Pipecolinic acid derivatives, method of manufacturing the same and therapeutic agents containing these compounds
申请人:——
公开号:US20010056184A1
公开(公告)日:2001-12-27
The present invention provides a compound of the general formula (I) or a pharmaceutical salt thereof,
1
wherein, when R
1
and R
2
are the same they are represented by ═O, ═N, —OR
9
(where R
9
is hydrogen, lower alkyl or benzyl), when R
1
and R
2
are different and one of R
1
and R
2
is represented by hydrogen, the other is represented by —R
5
—R
6
—, (where R
5
is —O—, —NH—, —NHCO—, or —NHSO
2
—, and where R
6
is hydrogen, lower alkyl, —Ph—R
7
, —(CH
2
)n—O—Ph—R
7
, (where n=1-6, R
7
is hydrogen, hydroxy, lower alkyl, lower alkoxy, halogen, nitro, or pyridyloxy), indolyl, N-oxidepyridyl, phthalimide, thienyl, or pyridyl); R
3
represents —COOH, —COOEt, —COOMe, —CH
2
N(OH)CHO, or —CONHOH; R
4
represents lower alkyl, thienyl, —Ph—R
8
(where R
9
represents hydroxy, lower alkyl, lower alkoxy, nitro, halogen, pyridyloxy, or phenyl group substituted hydrogen, lower alkyl, lower alkoxy, hydroxy, and halogen), and methods of making compounds within the class of the general formula (I).
本发明提供了一般式(I)的化合物或其药用盐,其中,当R1和R2相同时,它们分别表示为H、N、—OR9(其中R9为氢、低烷基或苄基);当R1和R2不同且其中一个为氢时,另一个表示为—R5—R6—(其中R5为—O—、—NH—、—NHCO—或—NHSO2—,而R6为氢、低烷基、—Ph—R7、—(CH2)n—O—Ph—R7(其中n=1-6,R7为氢、羟基、低烷基、低烷氧基、卤素、硝基或吡啶氧基)、吲哚基、N-氧化吡啶基、邻苯二酰亚胺基、噻吩基或吡啶基);R3表示—COOH、—COOEt、—COOMe、—CH2N(OH)CHO或—CONHOH;R4表示低烷基、噻吩基、—Ph—R8(其中R8表示羟基、低烷基、低烷氧基、硝基、卤素、吡啶氧基或苯基取代的氢、低烷基、低烷氧基、羟基和卤素);以及制备一般式(I)类化合物的方法。