Salt suitable for an acid generator and a chemically amplified resist composition containing the same
申请人:Yamaguchi Satoshi
公开号:US20070122750A1
公开(公告)日:2007-05-31
The present invention provides a salt of the formula (I):
wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q
1
and Q
2
each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A
+
represents organic counter ion.
The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).