申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150322027A1
公开(公告)日:2015-11-12
A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.
一种单体(1)是通过将一种化合物(9)与碱或金属反应形成金属烯醇盐试剂,然后将金属烯醇盐试剂与一种酰氧基酮化合物(8)反应而制备的。由该单体派生出的聚合物用作基础树脂,以配制一种光刻胶组合物,该组合物在常温下稳定,显示出高溶解对比度、控制的酸性扩散和在碱性显影形成正图案以及有机溶剂显影形成负图案时低粗糙度。