(1-环己基-乙基)-乙烯基醚 | 103985-41-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: (1-环己基-乙基)-乙烯基醚
• 英文名称: (1-cyclohexyl-ethyl)-vinyl ether
• 英文别名: (1-Cyclohexyl-aethyl)-vinyl-aether；1-Ethenoxyethylcyclohexane
• CAS: 103985-41-7
• 化学式: C₁₀H₁₈O
• 分子量: 154.252
• InChiKey: CUQWKQBCRIIHDO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  1-环己基乙醇 、 乙炔 在 氢氧化钾 作用下， 生成 (1-环己基-乙基)-乙烯基醚
  参考文献：
  名称：

  Reppe et al., Justus Liebigs Annalen der Chemie, 1956, vol. 601, p. 81,104

  摘要：

  DOI：

文献信息

• 3-(2-Acylamino-1-Hydroxyethyl)-Morpholine Derivatives and Their Use as Bace Inhibitors
  申请人：Broughton Barff Howard

  公开号：US20070225267A1

  公开（公告）日：2007-09-27

  The present invention provides BACE inhibitors of Formula (I); methods for their use and preparation, and intermediates useful for their preparation.

  本发明提供了化学式（I）的BACE抑制剂；以及它们的使用和制备方法，以及用于它们制备的中间体。
• SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120264060A1

  公开（公告）日：2012-10-18

  A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 respectively represent a single bond or a C1-C6 divalent saturated alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 respectively represent a C3-C36 hydrocarbon ring, R 1 and R 2 respectively represent a hydrogen atom or C1-C6 alkyl group, R 3 represents C1-C6 alkyl group, t represents an integer of 0 to 2 and Z + represents an organic counter ion

  一种由化学式（I）表示的盐：其中Q1和Q2分别代表氟原子或C1-C6全氟烷基基团，L1代表C1-C17的二价饱和碳氢基团，其中一个亚甲基基团可被氧原子或羰基取代，L2和L3分别代表单键或C1-C6的二价饱和烷基基团，其中一个亚甲基基团可被氧原子或羰基取代，环W1和环W2分别代表C3-C36的碳氢环，R1和R2分别代表氢原子或C1-C6烷基基团，R3代表C1-C6烷基基团，t代表0到2之间的整数，Z+代表有机对离子。
• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120295201A1

  公开（公告）日：2012-11-22

  A compound represented by formula (I): wherein T 1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 each independently represent a C3-C36 hydrocarbon ring, R 1 and R 2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R 3 and R 4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R 5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

  一个由化学式(I)表示的化合物：其中T1代表一个单键或一个C6-C14芳香烃基，L1代表一个C1-C17二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，L2和L3分别独立地代表一个单键或一个C1-C6二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，环W1和环W2分别独立地代表一个C3-C36碳氢环，R1和R2分别独立地代表一个氢原子、一个羟基或一个C1-C6烷基基团，R3和R4分别独立地代表一个羟基或一个C1-C6烷基基团，R5代表一个羟基或一个甲基基团，m代表0或1，t和u分别独立地代表0到2之间的整数。
• Positive photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20040048190A1

  公开（公告）日：2004-03-11

  A positive photoresist composition comprising: (A) an oxime sulfonate compound represented by the specific formula, (B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and (C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.

  一种正向光刻胶组合物，包括：（A）一种由特定公式表示的肟磺酸盐化合物，（B）一种树脂，包括重复单元，其中包括由特定公式表示并通过酸的作用增加在碱性显影溶液中的溶解度的基团，和（C）一种含有含氟烷基的聚合物化合物，其中包含由特定公式表示的单体衍生的重复单元。
• 100 Percent solids epoxy, nitrile coating compositions and method of making same
  申请人：THE STANDARD OIL COMPANY

  公开号：EP0199529A2

  公开（公告）日：1986-10-29

  The invention relates to a process for producing the 100 percent solids epoxy nitrile coating compositions comprising: 1) forming a mixture of the epoxy resins with the epoxy nitrile monomers and curing agents, 2) applying the mixture to a substrate to form a coating, and 3) curing the coating so that in situ copolymerization of the epoxy resin and epoxy-nitrile monomer results in a multifunctional epoxy nitrile coating system.

  本发明涉及一种生产 100%固体环氧腈涂料组合物的工艺，包括：1）将环氧树脂与环氧腈单体和固化剂形成混合物；2）将混合物涂抹到基材上形成涂层；3）固化涂层，使环氧树脂和环氧腈单体原位共聚，形成多功能环氧腈涂料体系。