di-n-octyl itaconate | 22501-68-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: di-n-octyl itaconate
• 英文别名: n-octyl itaconate；methylene-succinic acid dioctyl ester；Methylen-bernsteinsaeure-dioctylester；Dioctyl 2-methylidenebutanedioate
• CAS: 22501-68-4
• 化学式: C₂₁H₃₈O₄
• 分子量: 354.53
• InChiKey: NQPOXJIXYCVBDO-UHFFFAOYSA-N

物化性质

• 沸点：
  428.9±20.0 °C(Predicted)
• 密度：
  0.940±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7.3
• 重原子数：
  25
• 可旋转键数：
  19
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.81
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

安全信息

• 海关编码：
  2917190090

反应信息

• 作为反应物：
  描述：

  辛胺 、 di-n-octyl itaconate 生成 1-octyl-5-oxo-pyrrolidine-3-carboxylic acid octyl ester
  参考文献：
  名称：

  Vinyl halide resins plasticized with 1-substituted-4-carboalkoxy-2-pyrrolidinone

  摘要：

  公开号：

  US02811496A1
• 作为产物：
  描述：

  辛醇 、 衣康酸 在 对甲苯磺酸 、 对苯二酚 作用下， 以 甲苯 为溶剂， 生成 di-n-octyl itaconate
  参考文献：
  名称：

  Kumar, Gulshan; Aggarwal, Saroj; Choudhary, Veena, Indian Journal of Chemistry, Section A: Inorganic, Physical, Theoretical and Analytical, 2003, vol. 42, # 10, p. 2523 - 2526

  摘要：

  DOI：

文献信息

• [EN] SURFACTANTS<br/>[FR] TENSIOACTIFS
  申请人：AMYRIS INC

  公开号：WO2012103156A1

  公开（公告）日：2012-08-02

  This application relates to derivatives of hydrocarbon terpenes (e.g., myrcene or farnesene), to methods of making the derivatives, and to the use of the derivatives as surfactants.

  这个应用涉及到碳氢化合物萜类化合物（例如，肉豆蔻烯或芬尼烯）的衍生物，制备这些衍生物的方法，以及将这些衍生物用作表面活性剂的用途。
• ANTIFOULING COMPOSITIONS INCLUDING DIOXABORINANES AND USES THEREOF
  申请人：EMPIRE TECHNOLOGY DEVELOPMENT LLC

  公开号：US20140037704A1

  公开（公告）日：2014-02-06

  An antifouling composition including a compound having a dioxaborinane moiety is provided. Methods of killing, or deterring the growth of, one or more organisms on an article include coating or impregnating the article with the antifouling composition, where the organisms live in fresh water or salt water.

  提供一种包括具有二氧硼环基团的化合物的防污组合物。在物品上涂覆或浸渍该防污组合物的方法包括杀灭或阻止一种或多种生物在物品上生长，这些生物生活在淡水或盐水中。
• Acid-degradable resin compositions containing ketene-aldehyde copolymer
  申请人：Sudo Atsushi

  公开号：US20050130057A1

  公开（公告）日：2005-06-16

  It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R 1 and R 2 independently represent hydrogen atom, halogen atom, C 1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R 4 group, S(O) n R 4 group, P(═O)(R 4 ) 2 group or M(R 4 ) 3 group; R 3 represents C 1-20 hydrocarbon group or a heterocyclic group: R 4 represents C 1-20 hydrocarbonoxy group, C 1-20 hydrocarbon group, C 1-20 hydrocarbonthio group or mono- or di-C 1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2 , and an acid or a compound capable of generating an acid in response to an external stimulus.

  本发明旨在提供用于制备高灵敏度和高分辨率细微图案的抗蚀剂等组合物，通过增加曝光部分和未曝光部分之间的溶解度差异。可降解酸性组合物包含具有以下通式（I）所表示的重复单元的聚合物：其中，R1和R2独立地表示氢原子、卤素原子、C1-20碳氢基团、杂环基团、氰基团、硝基团、C（═O）R4基团、S（O）nR4基团、P（═O）（R4）2基团或M（R4）3基团；R3表示C1-20碳氢基团或杂环基团；R4表示C1-20碳氢氧基团、C1-20碳氢基团、C1-20碳氢硫基团或单烷基或二烷基氨基基团；M表示硅、锗、锡或铅原子；n为0、1或2，以及一种酸或能够响应外部刺激产生酸的化合物。
• PHOTOREACTIVE AGENT FOR REMOVING HARMFUL MATERIALS
  申请人：——

  公开号：US20020006425A1

  公开（公告）日：2002-01-17

  The present invention provides a photoreactive agent for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate; and a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing film-forming inorganic fine particles and a layer containing a water repellent which layers are formed in that order on at least one side of the substrate. Said photoreactive agents for removing harmful materials are excellent in ability to remove harmful materials such as malodor, are water-resistant, are not changed in characteristics over a long period of time, and can easily be produced.

  本发明提供了一种光敏剂，用于去除有害物质，其中包括基底和涂有无机细粒子的有机细粒子层以及包含光敏半导体的层，该层形成在基底的至少一侧；一种去除有害物质的光敏剂，包括基底、包含光敏半导体的层和包含涂有无机细粒子的有机细粒子的层，这些层按顺序形成在基底的至少一侧；一种去除有害物质的光敏剂，包括基底、包含光敏半导体的层、包含成膜无机细粒子和疏水剂的层，这些层按顺序形成在基底的至少一侧；以及一种去除有害物质的光敏剂，包括基底、包含光敏半导体的层、包含成膜无机细粒子和包含疏水剂的层，这些层按顺序形成在基底的至少一侧。这些去除有害物质的光敏剂具有出色的去除恶臭等有害物质的能力，耐水性强，长期内不会改变特性，而且易于生产。
• Water-absorbing material and absorbent article employing the same
  申请人：——

  公开号：US20030045198A1

  公开（公告）日：2003-03-06

  The water absorbent material of the present invention is composed of a copolymer of an anhydropolyamino acid having at least one ethylenically unsaturated double bond in a molecule, a water-soluble monomer having an ethylenically unsaturated double bond and polysaccharides, and has high water absorption ratio and high water absorption rate in pure water or water having a low ion content and also has high absorption properties for high concentration salt-containing solutions.

  本发明的吸水材料由至少在分子中具有一个乙烯基不饱和双键的无水多氨基酸共聚物、具有乙烯基不饱和双键的水溶性单体和多糖组成，具有高吸水比和高吸水速率，在纯水或低离子含量的水中具有高吸收性能，并且对高浓度盐含量的溶液也具有高吸收性能。