申请人:E. R. Squibb & Sons, Inc.
公开号:US04271157A1
公开(公告)日:1981-06-02
A compound of the formula ##STR1## wherein R is hydrogen, alkali metal, ##STR2## R.sub.1 is hydrogen or methyl; R.sub.2 is hydrogen or methyl; R.sub.3 is hydrogen or methyl; R.sub.4 is hydrogen, --OCONH.sub.2, ##STR3## R.sub.5 is hydrogen or methyl; R.sub.6 is hydrogen, methyl, benzyl or acetyl; R.sub.7 is hydrogen or lower alkyl; R.sub.8 is hydrogen or --CONH.sub.2 ; R.sub.9 is hydrogen, lower alkyl, ##STR4## or --(CH.sub.2).sub.p --N--(lower alkyl).sub.2 ; R.sub.10 is hydrogen or lower alkyl; R.sub.11 is hydrogen, sodium or potassium; n is 1, 2, 3 or 4; m is 0, 1 or 2; p is 1, 2, 3 or 4.
式为##STR1##的化合物,其中R为氢、碱金属、##STR2##;R.sub.1为氢或甲基;R.sub.2为氢或甲基;R.sub.3为氢或甲基;R.sub.4为氢、--OCONH.sub.2、##STR3##;R.sub.5为氢或甲基;R.sub.6为氢、甲基、苄基或乙酰基;R.sub.7为氢或低碳烷基;R.sub.8为氢或--CONH.sub.2;R.sub.9为氢、低碳烷基、##STR4##或--(CH.sub.2).sub.p--N--(低碳烷基).sub.2;R.sub.10为氢或低碳烷基;R.sub.11为氢、钠或钾;n为1、2、3或4;m为0、1或2;p为1、2、3或4。