Direct reductive amination using triethylsilane and catalytic bismuth(III) chloride
作者:Takehiko Matsumura、Masahisa Nakada
DOI:10.1016/j.tetlet.2014.01.132
日期:2014.3
Direct reductive amination (DRA) using triethylsilane (TESH) and catalytic bismuth(III) chloride (BiCl3) is described for the first time. The use of TESH and BiCl3 provides easy handling, low cost, non-toxicity, and a mild Lewis acid activity, thereby meeting the demand for green and sustainable chemistry. The developed DRA is highly chemoselective and applicable to less-basic amines. The experimental
首次描述了使用三乙基硅烷(TESH)和催化氯化铋(III)(BiCl 3)的直接还原胺化(DRA)。TESH和BiCl 3的使用提供了易于处理,低成本,无毒和温和的路易斯酸活性,从而满足了对绿色和可持续化学的需求。研发的DRA具有高度的化学选择性,适用于碱性较低的胺。这项研究的实验结果表明,发达的DRA可以被BiCl 3催化,通过TESH可以逐渐将其还原为Bi(0)或低价的铋,而TESCl,Bi(0)和Bi(0)可以被BiSH 3催化。TESC1在一定程度上催化了DRA。