4-[(4-hydroxyphenyl)phenanthren-9-ylmethyl]phenol | 796874-25-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 菲及其衍生物
• 英文名称: 4-[(4-hydroxyphenyl)phenanthren-9-ylmethyl]phenol
• 英文别名: 4,4'-(phenanthren-9-ylmethylene)diphenol；4-[(4-Hydroxyphenyl)-phenanthren-9-ylmethyl]phenol
• CAS: 796874-25-4
• 化学式: C₂₇H₂₀O₂
• 分子量: 376.455
• InChiKey: GQPKGDQNAFDMJT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.1
• 重原子数：
  29
• 可旋转键数：
  3
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-[(4-hydroxyphenyl)phenanthren-9-ylmethyl]phenol 在 potassium carbonate 作用下， 以 乙醇 为溶剂， 生成 1-[4-[[4-(2-Hydroxy-3-pyrrolidin-1-yl-propoxy)phenyl]-(9-phenanthryl)methyl]phenoxy]-3-pyrrolidin-1-yl-propan-2-ol
  参考文献：
  名称：

  二芳氧基甲氧基菲的2-羟基-氨基烷基衍生物的合成和抗结核活性。

  摘要：

  从环氧乙烷与不同胺的亲核反应中合成了一系列的二芳氧基甲氧基菲的2-羟基-氨基烷基衍生物。评估了这些化合物在体外对结核分枝杆菌H（37）R（v）的抗结核活性，其MIC在3.12-25microg / ml的范围内。

  DOI：

  10.1016/j.bmcl.2005.08.045
• 作为产物：
  描述：

  9-溴菲 在 三氯化铝 、 四氯化锡 、 magnesium 作用下， 以 四氢呋喃 、 正戊烷 、 苯 为溶剂， 反应 3.0h， 生成 4-[(4-hydroxyphenyl)phenanthren-9-ylmethyl]phenol
  参考文献：
  名称：

  Diaryloxy methano phenanthrenes: a new class of antituberculosis agents

  摘要：

  A new series of diaryloxy methano phenanthrenes were prepared through tertiary-aminoalkylations of [(methoxy-phenyl)-phenanthren-9-yl-methyl]-phenols obtained from Friedel-Crafts alkylations on (methoxy-phenyl)-phenanthren-9-yl-methanols. These series of compounds were evaluated against Mycobacterium tuberculosis H37Rv and showed the desired activity in the range of 6.25 mug/mL in vitro. One of the compound 12j protects the mice from the challenge of M. tuberculosis in vivo, as 30% of the mice were survived at treatment of 50mg/kg body weight. (C) 2004 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.bmc.2004.07.058

文献信息

• Development of Transition‐Metal‐Free Lewis Acid‐Initiated Double Arylation of Aldehyde: A Facile Approach Towards the Total Synthesis of Anti‐Breast‐Cancer Agent
  作者：Sanjay Singh、Rina Mahato、Pragya Sharma、Naveen Yadav、Nagaraju Vodnala、Chinmoy Kumar Hazra

  DOI：10.1002/chem.202104545

  日期：2022.3.7

  reported. This protocol features mild conditions, feedstock reagents, very low catalyst loading, remarkable scope (>85 examples) and gram-scale synthesis (TON=475). Moreover, several unexplored biologically active molecules for example, the antiparkinson agent, vibrindole A, turbomycin B and, total synthesis of an anti-breast-cancer agent is demonstrated. Control experiments and mechanistic studies

  报道了一种用于合成对称/不对称三芳基甲烷和二芳基甲烷的无过渡金属方法。该协议具有温和的条件、原料试剂、极低的催化剂负载、显着的范围（>85 个示例）和克级合成（TON=475）。此外，还展示了几种未开发的生物活性分子，例如抗帕金森剂、vibrindole A、涡轮霉素 B 和抗乳腺癌剂的全合成。还进行了对照实验和机理研究，以检测反应中间体和反应进程，以阐明可能的反应机理。
• Cooperative Friedel–Crafts Alkylation of Electron‐Deficient Arenes via Catalyst Activation with Hexafluoroisopropanol**
  作者：Sanjay Singh、Sankalan Mondal、Vikas Tiwari、Tarak Karmakar、Chinmoy Kumar Hazra

  DOI：10.1002/chem.202300180

  日期：2023.3.28

  Herein, we report the challenging and scantily explored Friedel-Crafts alkylation of electron-deficient arenes using a “catalyst activation” approach. Through strong hydrogen bonding with solvent hexafluoroisopropanol (HFIP) the Brønsted acidity of the catalyst is increased which stabilizes the transition states of the Friedel-Crafts reaction via concerted mechanism.

  在此，我们报告了使用“催化剂活化”方法对缺电子芳烃进行具有挑战性且探索不足的 Friedel-Crafts 烷基化。通过与溶剂六氟异丙醇 (HFIP) 的强氢键结合，催化剂的 Brønsted 酸度增加，从而通过协同机制稳定 Friedel-Crafts 反应的过渡态。
• Resist composition
  申请人：Echigo Masatoshi

  公开号：US20080153031A1

  公开（公告）日：2008-06-26

  A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C 5-45 aromatic ketone or aromatic aldehyde with a C 6-15 compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.
• COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN
  申请人：Oguro Dai

  公开号：US20100316950A1

  公开（公告）日：2010-12-16

  A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
• AROMATIC HYDROCARBON RESIN AND COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY
  申请人：Ideno Ryuji

  公开号：US20120171611A1

  公开（公告）日：2012-07-05

  The aromatic hydrocarbon resin can be used as a coating material and a resist resin for a semiconductor, and has a high carbon concentration and a low oxygen concentration. A composition for forming an underlayer film for lithography that has excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed with the same, and a pattern forming method using the same are disclosed. An aromatic hydrocarbon is reacted with an aromatic aldehyde in the presence of an acidic catalyst, thereby providing an aromatic hydrocarbon resin that has a high carbon concentration of from 90 to 99.9% by mass and a low oxygen concentration of from 0 to 5% by mass. A composition for forming an underlayer film for lithography contains the resin and an organic solvent, an underlayer film is formed with the same, and a pattern forming method uses the same.