2-Methoxy-2-cyclopentenyl-propan | 55661-01-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-Methoxy-2-cyclopentenyl-propan
• 英文别名: 1-(2-Methoxypropan-2-yl)cyclopentene
• CAS: 55661-01-3
• 化学式: C₉H₁₆O
• 分子量: 140.225
• InChiKey: YEKVVZYAINYBAK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  甲醇 、 异丙亚基环戊烷 反应 8.0h， 生成 2-Methoxy-2-cyclopentenyl-propan
  参考文献：
  名称：

  Photochemistry of alkenes. IV. Vicinally unsymmetrical olefins in hydroxylic media

  摘要：

  DOI：

  10.1021/jo00905a004

文献信息

• RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
  申请人：Watanabe Takeru

  公开号：US20110195362A1

  公开（公告）日：2011-08-11

  There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
• US8835092B2
  申请人：——

  公开号：US8835092B2

  公开（公告）日：2014-09-16
• Photochemistry of alkenes. IV. Vicinally unsymmetrical olefins in hydroxylic media
  作者：Harold G. Fravel、Paul J. Kropp

  DOI：10.1021/jo00905a004

  日期：1975.8