2-adamantylpropan-2-yl acrylate | 300833-10-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-adamantylpropan-2-yl acrylate
• 英文别名: acrylic acid 1-(1-adamantyl)-1-methylethyl；1-(1-acryloyloxy-1-methylethyl)adamantane；1-(1'-adamantyl)-1-methylethyl acrylate；2-(1-adamantyl)propan-2-yl prop-2-enoate
• CAS: 300833-10-7
• 化学式: C₁₆H₂₄O₂
• 分子量: 248.365
• InChiKey: LRNVAYLPTLYWSI-UHFFFAOYSA-N

物化性质

• 沸点：
  316.3±11.0 °C(Predicted)
• 密度：
  1.070±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.81
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-adamantylpropan-2-yl acrylate 、 4-羟基苯硫酚 在 三乙胺 作用下， 以 甲醇 、 乙酸乙酯 为溶剂， 生成 2-adamantylpropan-2-yl 3-(4-hydroxyphenylthio)propanoate
  参考文献：
  名称：

  Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition

  摘要：

  一种光敏组合物，其中包含具有规范中所述特定结构的化合物，使用该光敏组合物和使用在光敏组合物中的具有特定结构的化合物的图案形成方法。

  公开号：

  US08426101B2
• 作为产物：
  描述：

  丁基金刚烷-1-羧酸酯 、 丙烯酰氯 在 sodium chloride 、 甲基锂 、 sodium carbonate 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 生成 2-adamantylpropan-2-yl acrylate
  参考文献：
  名称：

  EP1344762

  摘要：

  公开号：

文献信息

• Process for preparation of tertiary alcohol esters
  申请人：——

  公开号：US20040015006A1

  公开（公告）日：2004-01-22

  The production process of the present invention comprises a step of allowing a carboxylic acid derivative represented by the formula (1): 1 wherein ring Z is a monocyclic or polycyclic non-aromatic or aromatic ring, and R 1 is a halogen atom or a group represented by the formula (2): —OR  (2) wherein R is a hydrogen atom or a hydrocarbon group, to react with an organometallic compound represented by the formula (3): R 2 —M  (3) wherein R 2 is a hydrocarbon group, and M is a metallic atom which may have a ligand, or the formula (4): —MgY  (4) wherein Y is a halogen atom, and a carboxylic acid halide represented by the formula (5): 2 wherein R 3 is a hydrocarbon group or a heterocyclic group, and X is a halogen atom, to yield the tertiary alcohol ester represented by the formula (6): 3 wherein Z, R 2 and R 3 have the same meanings as defined above. According to the present invention, a tertiary alcohol compound having a tertiary carbon combined with a ring group can be easily and efficiently produced from carboxylic acid derivative which is comparatively cheap and readily available.

  本发明的生产过程包括允许由式（1）表示的羧酸衍生物进行反应的步骤： 其中环Z是单环或多环非芳香或芳香环，R1是卤素原子或由式（2）表示的基团： 其中R是氢原子或碳氢基团，与由式（3）表示的有机金属化合物发生反应： 其中R2是碳氢基团，M是可能具有配体的金属原子，或由式（4）表示的： 其中Y是卤素原子，以及由式（5）表示的羧酸卤化物： 其中R3是碳氢基团或杂环基团，X是卤素原子，得到由式（6）表示的三级醇酯： 其中Z、R2和R3具有上述定义的相同含义。根据本发明，可以从相对便宜且易于获得的羧酸衍生物中轻松高效地生产具有三级碳与环基结合的三级醇化合物。
• (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
  申请人：——

  公开号：US20040063882A1

  公开（公告）日：2004-04-01

  The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. 1 wherein each of R 1 , R 2 , R 3 and R 4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X 1 or X 2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A 1 and A 2 represent hydrogen atoms, or A 1 and A 2 form —O—, —CH 2 — or —CH 2 CH 2 —.

  本发明的（甲基）丙烯酸酯由以下公式（1）表示。可以通过首先通过还原1,3-二烯和马来酸酐之间的Diels-Alder反应得到的加成产物来制备内酯，然后水解内酯以产生醇，随后对醇进行（甲基）丙烯化来生产（甲基）丙烯酸酯。通过共聚合包含本发明的（甲基）丙烯酸酯的单体组成物制备的聚合物在透明度，干法蚀刻抗性和有机溶剂溶解性方面表现出色，因此最好将其用作化学放大抗蚀剂组合物的树脂。其中R1、R2、R3和R4中的每一个代表氢原子、甲基基团或乙基基团；X1或X2中的任意一个代表（甲基）丙烯酰氧基，另一个代表氢原子；A1和A2均表示氢原子，或A1和A2形成-O-，-CH2-或-CH2CH2-。
• (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern
  申请人：Kamon Yoshihiro

  公开号：US20050113538A1

  公开（公告）日：2005-05-26

  The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. wherein each of R 1 , R 2 , R 3 and R 4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X 1 or X 2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A 1 and A 2 represent hydrogen atoms, or A 1 and A 2 form —O—, —CH 2 — or —CH 2 CH 2 —.

  本发明的（甲基）丙烯酸酯由以下公式（1）表示。可以通过首先通过还原1,3-二烯和马来酸酐之间的Diels-Alder反应得到的加成产物来生产内酯，然后使内酯水合生成醇，接着对醇进行（甲基）丙烯化来生产（甲基）丙烯酸酯。通过共聚或聚合包含本发明的（甲基）丙烯酸酯的单体组成的聚合物在透明度，干法蚀刻抵抗力和有机溶剂溶解性方面表现出色，因此最好用作化学增感抗蚀剂组成物的树脂。 其中，R1、R2、R3和R4中的每一个代表氢原子、甲基基团或乙基基团；X1或X2中的任意一个代表（甲基）丙烯酰氧基，另一个代表氢原子；A1和A2都代表氢原子，或者A1和A2形成-O-，-CH2-或-CH2CH2-。
• Chemically amplifying type positive resist composition
  申请人：——

  公开号：US20020146641A1

  公开（公告）日：2002-10-10

  A chemically amplifying type positive resist composition suitable for use in the lithography utilizing an ArF or KrF excimer laser and excellent in the shape of profile is provided, which comprises a resin which has an alkali-soluble group protected by 2-alkyl-2-adamantyl group or 1-adamantyl-1-alkylalkyl group, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of an acid; and a sulfonium salt acid generating agent represented by the following formula (I): 1 wherein Q 1 , Q 2 and Q 3 independently represent hydrogen, hydroxyl, alkyl having 1 to 6 carbon atoms or alkoxy having 1 to 6 carbon atoms; and Q 4 represents perfluoroalkyl which may have a cyclic structure.

  提供了一种化学放大型正性光刻胶组合物，适用于利用ArF或KrF准分子激光进行光刻，并且在轮廓形状方面表现出色。该组合物包括一种树脂，其具有由2-烷基-2-亚当基基团或1-亚当基-1-烷基烷基团保护的碱溶性基团，本身在碱中不溶或微溶，但在酸的作用下变得可溶于碱；以及由以下式（I）表示的磺酸盐酸发生剂： 其中Q1、Q2和Q3独立地表示氢、羟基、1至6个碳原子的烷基或1至6个碳原子的烷氧基；而Q4表示可能具有环状结构的全氟烷基。
• Polymeric compound and resin composition for photoresist
  申请人：Kabushiki Kaisha Toshiba

  公开号：US06440636B1

  公开（公告）日：2002-08-27

  A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.

  一种聚合物化合物包括至少一个以下式(I)的单体单位：其中R1是氢原子或甲基基团；R2和R3中的每一个都是独立的氢原子或羟基。该聚合物化合物可以包括该单体单位和至少一种由以下式(IIa)和(IIb)表示的单体单位：其中R1是氢原子或甲基基团；R4和R5中的每一个都可以是氢原子、羟基、氧代基或羧基，其中R4和R5不能同时是氢原子；R7和R8中的每一个都是独立的氢原子、羟基或氧代基。该聚合物化合物除了具有令人满意的透明度、碱溶性和附着力外，还具有高蚀刻抗性。