RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160075806A1
公开(公告)日:2016-03-17
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:
wherein R
3
represents a hydrogen atom or a methyl group, and R
4
represents a C
1
to C
24
saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.