1,4-oxathiepane-2-yl-methacrylate | 1184819-95-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1,4-oxathiepane-2-yl-methacrylate
• 英文别名: 1,4-Oxathiepan-2-yl 2-methylprop-2-enoate
• CAS: 1184819-95-1
• 化学式: C₉H₁₄O₃S
• 分子量: 202.274
• InChiKey: BVYYQTFGPUCJIH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  60.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  1,4-oxathiepane-2-yl-methacrylate 在 甲烷磺酸 作用下， 以 tetrachloroethane, 1,1,2,2-d2 为溶剂， 生成 甲基丙烯酸
  参考文献：
  名称：

  ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS

  摘要：

  一种化学式为(II-1)的环状醇：其中：R2、R3和R4分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；或者R2和R3或R3和R4结合形成由3至6个碳原子组成的亚烯基基团；m为1或2；R5、R6、R7、R8、R9和R10分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；A为氧原子；B为氧原子或硫原子。此外，一种制备化学式(II-1)的环状醇的方法。

  公开号：

  US20120316349A1
• 作为产物：
  描述：

  3-(2,2-dimethoxyethylthio)-1-propanol 在 4-二甲氨基吡啶 、 吩噻嗪 、 硫酸 、 水 、 三乙胺 作用下， 以 四氢呋喃 为溶剂， 3.0~60.0 ℃ 、18.0 kPa 条件下， 反应 16.0h， 生成 1,4-oxathiepane-2-yl-methacrylate
  参考文献：
  名称：

  ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS

  摘要：

  一种化学式为(II-1)的环状醇：其中：R2、R3和R4分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；或者R2和R3或R3和R4结合形成由3至6个碳原子组成的亚烯基基团；m为1或2；R5、R6、R7、R8、R9和R10分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；A为氧原子；B为氧原子或硫原子。此外，一种制备化学式(II-1)的环状醇的方法。

  公开号：

  US20120316349A1

文献信息

• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120295201A1

  公开（公告）日：2012-11-22

  A compound represented by formula (I): wherein T 1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 each independently represent a C3-C36 hydrocarbon ring, R 1 and R 2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R 3 and R 4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R 5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

  一个由化学式(I)表示的化合物：其中T1代表一个单键或一个C6-C14芳香烃基，L1代表一个C1-C17二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，L2和L3分别独立地代表一个单键或一个C1-C6二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，环W1和环W2分别独立地代表一个C3-C36碳氢环，R1和R2分别独立地代表一个氢原子、一个羟基或一个C1-C6烷基基团，R3和R4分别独立地代表一个羟基或一个C1-C6烷基基团，R5代表一个羟基或一个甲基基团，m代表0或1，t和u分别独立地代表0到2之间的整数。
• Oxime Compound and Resist Composition Containing the Same
  申请人：MASUYAMA Tatsuro

  公开号：US20100021847A1

  公开（公告）日：2010-01-28

  An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R 1 ) represents a C1-C30 aliphatic hydrocarbon group etc., R 2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q 1 and Q 2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：Ichikawa Koji

  公开号：US20110053082A1

  公开（公告）日：2011-03-03

  A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that optionally has one or more halogen atoms; X 1 represents a C 2 to C 36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C 1 to C 24 hydrocarbon group, a C 1 to C 12 alkoxyl group, a C 2 to C 4 acyl group, or a C 2 to C 4 acyloxy group, and one or more —CH 2 — contained in the heterocyclic group may be replaced by —CO— or —O—.
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110200935A1

  公开（公告）日：2011-08-18

  The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): wherein R 1 and R 2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have one or more substituents selected from the group consisting of a hydroxyl group, a cyano group, a fluorine atom, a trifluoromethyl group and a nitro group, and one or more —CH 2 — in the aliphatic hydrocarbon group can be replaced by —O— or —CO—, or R 1 and R 2 are bonded each other to form a C4-C20 nitrogen-containing ring together with the nitrogen atom to which they are bonded, an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：YOSHIDA Isao

  公开号：US20120052440A1

  公开（公告）日：2012-03-01

  The present invention provides a salt represented by the formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 and L 2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, ring W 1 and ring W 2 independently each represent a C3-C36 aliphatic ring, R 2 is independently in each occurrence a C1-C6 alkyl group, R 4 is independently in each occurrence a C1-C6 alkyl group, R 3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z + represents an organic counter ion.