Synthesis and ring-opening metathesis polymerization of fullerene-containing α,ω-bis-norbornenes
摘要:
Metathesis polymerization of bis[4-(bicyclo[2.2.1]hept-5-en-2-yl)-4-oxo-3-oxabutyl]cyclopropa[1,9]-C-60-fullerene-3',3'-dicarboxylate affords insoluble polymer, while a copolymer with the parent malonate is soluble in typical organic solvents.
Synthesis and ring-opening metathesis polymerization of fullerene-containing α,ω-bis-norbornenes
摘要:
Metathesis polymerization of bis[4-(bicyclo[2.2.1]hept-5-en-2-yl)-4-oxo-3-oxabutyl]cyclopropa[1,9]-C-60-fullerene-3',3'-dicarboxylate affords insoluble polymer, while a copolymer with the parent malonate is soluble in typical organic solvents.
Photopolymerization initiator and photosensitive composition employing the same
申请人:CANON KABUSHIKI KAISHA
公开号:EP0353030B1
公开(公告)日:1995-03-15
INK-JET INK COMPOSITION FOR ETCHING RESIST
申请人:Sato Masaki
公开号:US20110024392A1
公开(公告)日:2011-02-03
An ink composition for ink jet printing is provided which gives a cured object excellent in adhesion to metallic plates, resistance to etchants, and alkali removability and can be stably ejected with an ink jet apparatus. The ink jet composition for etching resists has a viscosity at 25° C. of 3-50 mPa s and includes monomers comprising: either a polymerizable phosphoric ester compound represented by general formula (I); a polyfunctional monomer having two or more ethylenic double-bond groups per molecule and having no phosphoric ester group, the content of the ethylenic double-bond groups being 4×10
−3
to 8×10
−3
mol/g; and a monofunctional monomer having one ethylenic double-bond group per molecule and having neither phosphoric ester group nor carboxy group.
In the formula, X represents C
1-3
alkylene, Y represents C
2-3
alkylene, and R represents hydrogen or methyl.
RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME
申请人:MASUYAMA Tatsuro
公开号:US20120270154A1
公开(公告)日:2012-10-25
The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I):
wherein R
1
represents a hydrogen atom or a methyl group, A
2
represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A
1
represents a group represented by the formula (a-g1):
A
10
-X
10
s
A
11
- (a-g1)
wherein A
10
is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A
11
represents a C1-C5 aliphatic hydrocarbon group, X
10
is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and
a photoresist composition comprising the resin and an acid generator.