摩熵化学
数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

3-乙基-2-甲基庚烷-3-醇 | 66719-37-7

中文名称
3-乙基-2-甲基庚烷-3-醇
中文别名
——
英文名称
3-ethyl-2-methyl-heptan-3-ol
英文别名
Aethyl-isopropyl-butyl-carbinol;3-Aethyl-2-methyl-heptan-3-ol;3-Ethyl-2-methylheptan-3-ol
3-乙基-2-甲基庚烷-3-醇化学式
CAS
66719-37-7
化学式
C10H22O
mdl
——
分子量
158.284
InChiKey
GYCRUUSYQLIIBA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    191-195 °C
  • 密度:
    0.8455 g/cm3

计算性质

  • 辛醇/水分配系数(LogP):
    3.4
  • 重原子数:
    11
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

反应信息

点击查看最新优质反应信息

文献信息

  • PYRIDO[3,4-B]INDOLES AND METHODS OF USE
    申请人:JAIN Rajendra Parasmal
    公开号:US20110237582A1
    公开(公告)日:2011-09-29
    This disclosure relates to new heterocyclic compounds that may be used to modulate a histamine receptor in an individual. Pyrido[3,4-b]indoles are described, as are pharmaceutical compositions comprising the compounds and methods of using the compounds in a variety of therapeutic applications, including the treatment of a cognitive disorder, psychotic disorder, neurotransmitter-mediated disorder and/or a neuronal disorder.
    本公开涉及新的杂环化合物,可用于调节个体中的组胺受体。描述了吡咯[3,4-b]吲哚,以及包含该化合物的制药组合物和使用该化合物进行多种治疗应用的方法,包括治疗认知障碍、精神障碍、神经递质介导的障碍和/或神经元障碍。
  • PYRIDO[4,3-B]INDOLES AND METHODS OF USE
    申请人:Jain Rajendra Parasmal
    公开号:US20110245272A1
    公开(公告)日:2011-10-06
    This disclosure relates to new heterocyclic compounds that may be used to modulate a histamine receptor in an individual. Pyrido[4,3-b]indoles are described, as are pharmaceutical compositions comprising the compounds and methods of using the compounds in a variety of therapeutic applications, including the treatment of a cognitive disorder, psychotic disorder, neurotransmitter-mediated disorder and/or a neuronal disorder.
    本公开涉及新的杂环化合物,可用于调节个体的组胺受体。其中描述了吡啶并[4,3-b]吲哚,以及包含这些化合物的制药组合物和使用这些化合物在各种治疗应用中的方法,包括治疗认知障碍、精神障碍、神经递质介导的障碍和/或神经元障碍。
  • POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD
    申请人:JSR Corporation
    公开号:EP2309332A1
    公开(公告)日:2011-04-13
    A positive-tone radiation-sensitive composition is used for a resist pattern-forming method that includes double exposure as a given step, and includes (B) a polymer that includes an acid-labile group and a crosslinkable group, (C) a photoacid generator, and (D) a solvent.
    一种正色调辐射敏感性组合物用于抗蚀剂图案形成方法,该方法包括作为给定步骤的双重曝光,并包括 (B) 包含可酸标记基团和可交联基团的聚合物、(C) 光酸发生器和 (D) 溶剂。
  • Jamison; Lesslie; Turner, Journal of the Institute of Petroleum, 1949, vol. 35, p. 595
    作者:Jamison、Lesslie、Turner
    DOI:——
    日期:——
  • [EN] PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RAYONNEMENTS, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
    申请人:FUJIFILM CORP
    公开号:WO2013081168A1
    公开(公告)日:2013-06-06
    A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.
查看更多