(1-vinylcyclopentyl) acetate | 79753-71-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: (1-vinylcyclopentyl) acetate
• 英文别名: acetic acid-(1-vinyl-cyclopentyl ester)；Essigsaeure-(1-vinyl-cyclopentylester)；(1-Ethenylcyclopentyl) acetate
• CAS: 79753-71-2
• 化学式: C₉H₁₄O₂
• 分子量: 154.209
• InChiKey: ZXEHQRWEXBCFLB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  (1-vinylcyclopentyl) acetate 在 sodium acetate 、 溶剂黄146 、 N-溴代乙酰胺 作用下， 生成 (1-hydroxy-cyclopentyl)-ethane-1,2-diol
  参考文献：
  名称：

  Simple Analogs of the Antiarthritic Steroids¹

  摘要：

  DOI：

  10.1021/ja01646a047
• 作为产物：
  描述：

  1-乙炔基环戊醇 在 吡啶 、 palladium on activated charcoal 、 Lindlar's catalyst 作用下， 生成 (1-vinylcyclopentyl) acetate
  参考文献：
  名称：

  Simple Analogs of the Antiarthritic Steroids¹

  摘要：

  DOI：

  10.1021/ja01646a047

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371376A1

  公开（公告）日：2021-12-02

  A salt represented by formula (I): wherein R 1 and R 2 each independently represent a hydroxy group, —O—R 10 , —O—CO—O—R 10 or —O-L 1 -CO—O—R 10 ; L 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 4 , R 5 , R 7 and R 8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —; R 10 represents an acid-labile group; X 1 and X 2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI − represents an organic anion.

  一种由化学式（I）表示的盐：其中R1和R2分别代表一个羟基，-O-R10，-O-CO-O-R10或-O-L1-CO-O-R10；L1代表具有1至6个碳原子的烷二基基团；R4、R5、R7和R8分别独立地表示卤素原子，具有1至12个碳原子的烷基氟基团或具有1至18个碳原子的碳氢基团，碳氢基团可能有取代基，并且碳氢基团中包含的-CH2-可被-O-，-CO-，-S-或-SO2-取代；R10代表一个酸敏感基团；X1和X2分别独立地表示一个氧原子或一个硫原子；m1表示1至5的整数，m2和m8表示0至5的整数，m4、m5和m7表示0至4的整数；AI-代表一个有机阴离子。
• [EN] ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS<br/>[FR] ÉTHERS ET ESTERS DE CYCLOALCANOLS SUBSTITUÉS EN POSITION 1 DESTINÉS À ÊTRE UTILISÉS EN TANT QUE PRODUITS CHIMIQUES AROMATIQUES
  申请人：BASF SE

  公开号：WO2020079007A1

  公开（公告）日：2020-04-23

  The present invention relates to the use of an ether or an ester of a 1 -substituted cycloalkanol or of mixtures of two or more ethers or esters of 1 -substituted cycloalkanols or of a stereoisomer thereof or of a mixture of two or more stereoisomers thereof as aroma chemicals; to the use thereof for modifying the scent character of a fragranced composition; to an aroma chemical composition containing an ether or an ester of a 1 -substituted cycloalkanol or of mixtures of two or more ethers or esters of 1 -substituted cycloalkanols or of a stereoisomer thereof or of a mixture of two or more stereoisomers thereof; and to a method of preparing a fragranced composition or for modifying the scent character of a fragranced composition. The invention further relates to specific ethers or esters of 1 -substituted cycloalkanols.

  本发明涉及使用1-取代环烷醇的醚或酯，或两种或两种以上的1-取代环烷醇的醚或酯的混合物，或其立体异构体，或两种或两种以上的其立体异构体作为香气化学品的用途；用于修改香味组合物的气味特性；以及含有1-取代环烷醇的醚或酯，或两种或两种以上的1-取代环烷醇的醚或酯的混合物，或其立体异构体，或两种或两种以上的其立体异构体的香气化学品组合物；以及制备香味组合物或修改香味组合物的气味特性的方法。该发明还涉及特定的1-取代环烷醇的醚或酯。
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210286261A1

  公开（公告）日：2021-09-16

  Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):

  揭示了一种耐受组合物，包括由式（I）表示的化合物、具有酸敏基团和酸发生剂的树脂，其中具有酸敏基团的树脂包括至少从以下组中选择的一种：由式（a1-1）表示的结构单元和由式（a1-2）表示的结构单元。
• CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371377A1

  公开（公告）日：2021-12-02

  A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R 1 , R 2 and R 3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X 1 represents a single bond, —CH 2 —, —O—, —S—, —CO—, —SO— or —SO 2 —.

  一种以式(I)表示的羧酸盐、淬灭剂和包括该羧酸盐的抗蚀组合物：其中，R1、R2和R3分别表示卤素原子、氟代烷基或烃基，该烃基可以有取代基，烃基中包括的—CH2—可以被—O—、—CO—、—S—或—SO2—替换，m1表示0到5的整数，m2表示0到4的整数，m3表示0到3的整数，X1表示单键、— —、—O—、—S—、—CO—、—SO—或—SO2—。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210389669A1

  公开（公告）日：2021-12-16

  Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R 1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R 2 and R 3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH 2 — included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R 5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.

  揭示了一种由公式（I）表示的化合物，树脂和抗蚀组合物： 其中R1代表具有1至6个碳原子的烷基基团，其可以具有卤素，氢或卤素原子，R2和R3各自独立地表示氢原子或具有1至12个碳原子的碳氢基团，R4表示氟原子，具有1至6个碳原子的烷基氟化物基团或具有1至12个碳原子的烷基基团，且包括在烷基氟化物基团和烷基基团中的-CH2-可以被- O-或-CO-所取代，R5表示氢原子，具有2至6个碳原子的烷基羰基基团或酸敏感基团，m2表示1至4的整数，m4表示0至3的整数，m5表示1或2，在其中2≤m2+m4+m5≤5。