2-tert-butoxycarbonyl-3-carboxynorborna-5-ene

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-tert-butoxycarbonyl-3-carboxynorborna-5-ene
• 英文别名: D,L-3-tert-butoxycarbonyl-5-norbornene-2-carboxylic acid；3-[(2-Methylpropan-2-yl)oxycarbonyl]bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• 化学式: C₁₃H₁₈O₄
• 分子量: 238.284
• InChiKey: QWEPOABTHPBKBD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.69
• 拓扑面积：
  63.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  2-tert-butoxycarbonyl-3-carboxynorborna-5-ene 在 4-二甲氨基吡啶 、 potassium carbonate 、 间氯过氧苯甲酸 、 N,N'-二异丙基碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 反应 24.0h， 生成
  参考文献：
  名称：

  新的鎓盐、化学放大抗蚀剂组合物和图案化方法

  摘要：

  本发明为新的鎓盐、化学放大抗蚀剂组合物和图案化方法。提供新的鎓盐和包含其作为PAG的抗蚀剂组合物。当通过使用KrF或ArF准分子激光、EB或EUV的光刻法进行处理时，抗蚀剂组合物的酸扩散降低，曝光裕度、MEF和LWR改善。

  公开号：

  CN111087334B
• 作为产物：
  描述：

  纳迪克酸酐 、 potassium tert-butylate 以 四氢呋喃 为溶剂， 反应 6.0h， 以84%的产率得到2-tert-butoxycarbonyl-3-carboxynorborna-5-ene
  参考文献：
  名称：

  新的鎓盐、化学放大抗蚀剂组合物和图案化方法

  摘要：

  本发明为新的鎓盐、化学放大抗蚀剂组合物和图案化方法。提供新的鎓盐和包含其作为PAG的抗蚀剂组合物。当通过使用KrF或ArF准分子激光、EB或EUV的光刻法进行处理时，抗蚀剂组合物的酸扩散降低，曝光裕度、MEF和LWR改善。

  公开号：

  CN111087334B

文献信息

• 5-Fluorouracil derivatives, and their pharmaceutical compositions
  申请人：Fujisawa Pharmaceutical Company, Ltd.

  公开号：US04349552A1

  公开（公告）日：1982-09-14

  A compound of the formula: ##STR1## wherein R is a bridged alicyclic group selected from the group consisting of norbornyl, norbornenyl, bicyclo[2,2,2]-heptyl and adamantyl optionally substituted by at least one substituent selected from the group consisting of lower alkyl, carboxy, lower alkoxycarbonyl, alkylidenedioxy, N,N-di(lower)alkylcarbamoyl, amino, loweralkoxycarbonylamino and halogen. The present compound is useful in the therapeutic treatment of cancer in human beings and animals.

  一种化合物的化学式为：##STR1##其中R是从诺伯尼尔、诺伯烯基、双环[2,2,2]-庚基和金刚烷基中选择的桥环脂环基，可选择地被来自较低烷基、羧基、较低烷氧羰基、烷基二氧基、N,N-双(较低)烷基氨基甲酰、氨基、较低烷氧羰胺基和卤素的至少一种取代基取代。该化合物可用于治疗人类和动物的癌症。
• Novel photoresist monomer, polymer thereof and photoresist composition containing it
  申请人：Hyundai Electronics Industries Co., Ltd.

  公开号：US20020151666A1

  公开（公告）日：2002-10-17

  The present invention provides novel bicyclic photoresist monomers, and photoresist copolymer derived from the same. The bicyclic photoresist monomers of the present invention comprise both amine functional group and acid labile protecting group, and are represented by the formula: 1 where m, n, R, V and B are those defined herein. The photoresist composition comprising the photoresist copolymer of the present invention has excellent etching resistance and heat resistance, and remarkably enhanced PED stability (post exposure delay stability).

  本发明提供了新型的双环光刻单体和由其衍生的光刻共聚物。本发明的双环光刻单体包含氨基官能团和酸敏保护基，并由公式1表示：其中，m、n、R、V和B的定义如本文所述。本发明的光刻共聚物组成的光刻组合物具有优异的蚀刻抗性和耐热性，并且具有显著提高的后曝光延迟稳定性（PED稳定性）。
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these
  申请人：Taguchi Kazunori

  公开号：US20050148746A1

  公开（公告）日：2005-07-07

  A norbornene ring-opened polymer which in the molecule has repeating units represented by the formula (1): wherein R 1 represents Q, R 2 represents Q or C(═O)R 5 , R 3 represents Q or C(═O)R 6 , and R 4 represents Q or X—C(═O)R 7 (wherein Q represents hydrogen, a C 1-10 hydrocarbon group, etc.; R 5 , R 6 and R 7 each represents hydroxyl, C 1-10 alkoxyl, etc., provided that R 6 and R 7 may be bonded to each other to constitute oxygen, NH, etc.; X represents methylene, etc., provided that when R 2 is Q, then R 3 is C(═O)R 6 and R 4 is X—C(═O)R 7 and that when R 4 is Q, then R 2 is C(═O)R 5 , R 3 is C(═O)R 6 , and the configuration of R 2 and R 3 is trans, and m is 0 or 1), the polymer having a weight-average molecular weight as determined by gel permeation chromatography of 1,000 to 1,000,000. Also provided is a hydrogenation product of the norbornene ring-opened polymer. The norbornene ring-opened polymer and the hydrogenation product are excellent in heat resistance, electrical properties, etc.

  分子中具有由公式（1）表示的重复单元的去氢萘环开环聚合物：其中R1表示Q，R2表示Q或C（═O）R5，R3表示Q或C（═O）R6，R4表示Q或X—C（═O）R7（其中Q表示氢，C1-10烃基等；R5，R6和R7分别表示羟基，C1-10烷氧基等，但是当R6和R7结合形成氧，NH等时除外；X表示亚甲基等，但是当R2为Q时，R3为C（═O）R6，R4为X—C（═O）R7，当R4为Q时，R2为C（═O）R5，R3为C（═O）R6，并且R2和R3的构型为反式，m为0或1），该聚合物的重均分子量由凝胶渗透色谱法确定为1,000至1,000,000。还提供了去氢萘环开环聚合物的氢化产物。去氢萘环开环聚合物和氢化产物在耐热性，电学性能等方面表现出色。
• 5-Fluorouracil derivatives, preparation thereof and their pharmaceutical compositions
  申请人：FUJISAWA PHARMACEUTICAL CO., LTD.

  公开号：EP0010941A1

  公开（公告）日：1980-05-14

  The present invention provides compounds of the general formula:- wherein R is an optionally substituted bridged alicyclic radical or a substituted lower alkyl radical, the substituent being an optionally substituted bridged alicyclic group, an amino, protected amino, lower alkoxy, acyl, lower alkylthio, cyano(lower)alkylthio, arylthio or optionally substituted heterocyclic radical or a carboxy and esterified carboxy group, with the proviso, that when the substituent is a carboxy or esterified carboxy group then the lower alkyl radical contains 3 to 6 carbon atoms; or an unsubstituted or substituted lower alkenyl radical, the substituent being an optionally substituted bridged alicyclic group, an optionally substituted aryl radical or an optionally substituted heterocyclic radical; or a halophenyl radical; or an optionally substituted heterocyclic radical. 'The present invention also provides processes for the preparation of these compounds and pharmaceutical composition containing them. Furthermore, the present invention is concerned with a method of treating cancer which comprises administering these compounds to mammals suffering from cancer.

  本发明提供通式为：- 的化合物。 其中 R 是任选取代的桥式脂环基或取代的低级烷基，取代基是任选取代的桥式脂环基、氨基、保护氨基、低级烷氧基、酰基、低级烷硫基、氰基（低级）烷硫基、芳硫基或任选取代的杂环基或羧基和酯化羧基，但条件是当取代基是羧基或酯化羧基时，低级烷基含有 3 至 6 个碳原子；或未取代或取代的低级烯基，取代基为任选取代的桥式脂环基、任选取代的芳基或任选取代的杂环基；或卤代苯基；或任选取代的杂环基。 '本发明还提供了制备这些化合物和含有这些化合物的药物组合物的工艺。此外，本发明还涉及一种治疗癌症的方法，该方法包括对患有癌症的哺乳动物施用这些化合物。