ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING SAME, POLYMER USING SAME AS STARTING MATERIAL, AND RESIN COMPOSITION
申请人:Arai Yoshihisa
公开号:US20110319584A1
公开(公告)日:2011-12-29
Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F
2
excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.
In the formula, R
1
through R
3
, which may be the same or different, each represent a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a halogen-containing alkyl group; R
4
through R
8
, which may be the same or different, each represent an alkyl group having a carbon number of 1 to 3 or a halogen-containing alkyl group; X, which may be the same or different, represents a hydrogen atom, an alkyl group having a carbon number of 1 to 3, or a alkoxy group having a carbon number of 1 to 3; and n represents 14.
提供了以下公式(1)所代表的金刚烷衍生物,以及制备该衍生物的方法,包含在重复单元中具有公式(1)所代表的金刚烷结构的丙烯酸酯化合物的聚合物,以及包含该聚合物的功能性树脂组成物。该组成物具有优异的碱性显影性和基板粘附性,作为化学增强的抗Far-UV线(KrF准分子激光光、ArF准分子激光光、F2准分子激光光或EUV)的敏化剂,可以提高分辨率和线边粗糙度,同时不破坏其作为抗性的基本性质,如图案形成性能,干法刻蚀抗性,耐热性等。在公式中,R1至R3,可以相同也可以不同,分别代表氢原子,碳数为1到3的烷基或含卤素的烷基;R4至R8,可以相同也可以不同,分别代表碳数为1到3的烷基或含卤素的烷基;X,可以相同也可以不同,代表氢原子,碳数为1到3的烷基或碳数为1到3的烷氧基;n代表14。