Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films
作者:Lakmal C. Kalutarage、Philip D. Martin、Mary Jane Heeg、Charles H. Winter
DOI:10.1021/ja407014w
日期:2013.8.28
Treatment of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with 2 equiv of α-imino alkoxide salts K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) afforded M(RR'COCNtBu)2 or [Mn(RR'COCNtBu)2]2 in 9-75% yields. These complexes combine volatility and high thermal stability and have useful atomic layer deposition (ALD) precursor properties. Solution reactions between Ni, Co, and Mn complexes showed that BH3(NHMe2) can
用 2 当量的 α-亚氨基醇盐 K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) 处理 MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) 得到 M( RR'COCNtBu)2 或 [Mn(RR'COCNtBu)2]2 的产率为 9-75%。这些复合物结合了挥发性和高热稳定性,并具有有用的原子层沉积 (ALD) 前体特性。Ni、Co 和 Mn 配合物之间的溶液反应表明 BH3(NHMe2) 可以将它们全部还原为金属粉末。展示了 Ni、Co、Fe 和 Cr 薄膜的 ALD 生长。Mn 薄膜生长可能是可能的,但薄膜在暴露于空气时会完全氧化。