申请人:Maruzen Petrochrmical Co., Ltd.
公开号:US20200392066A1
公开(公告)日:2020-12-17
Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):
(wherein R
1
represents a hydrogen atom or a methyl group, R
2
represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
提供了一种化合物,该化合物可以用于制备具有优异灵敏度、分辨率和蚀刻抗性的树脂,或类似物,该化合物由以下式(1)所表示的化合物组成:(其中R1代表氢原子或甲基基团,R2代表具有1至6个碳原子的脂肪族碳氢基团,m代表0至5的整数,n代表0至4的整数)。