Compounds and Pharmaceutical Compositions for the Treatment of Viral Infections
申请人:Cretton-Scott Erika
公开号:US20100003217A1
公开(公告)日:2010-01-07
Provided herein are compounds, compositions and methods for the treatment of liver disorder, including HCV infections. Specifically, compound and compositions of nucleoside derivatives are disclosed, which can be administered either alone or in combination with other anti-viral agents.
Compounds and pharmaceutical compositions for the treatment of viral infections
申请人:IDENIX Pharmaceuticals, Inc.
公开号:EP2476690A1
公开(公告)日:2012-07-18
Provided herein are compounds, compositions and methods for the treatment of liver disorder, including HCV infections. Specifically, compound and compositions of nucleoside derivatives are disclosed, which can be administered either alone or in combination with other anti-viral agents.
Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
申请人:FUJIFILM Corporation
公开号:US10031419B2
公开(公告)日:2018-07-24
There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.
COMPOUNDS AND PHARMACEUTICAL COMPOSITIONS FOR THE TREATMENT OF VIRAL INFECTIONS
申请人:IDENIX Pharmaceuticals, Inc.
公开号:EP2307434B1
公开(公告)日:2014-02-12
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
申请人:Hirano Shuji
公开号:US20110236828A1
公开(公告)日:2011-09-29
An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.