sek-Butylperoxyacetat | 41863-31-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: sek-Butylperoxyacetat
• 英文别名: sec-Butyl-peroxyacetat；Ethylethoxy acetate；butan-2-yl ethaneperoxoate
• CAS: 41863-31-4
• 化学式: C₆H₁₂O₃
• 分子量: 132.159
• InChiKey: HICROKBBELKCCM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  6-acetyl-3-(2,4-dichlorophenyl)-1,9-dimethyl-1,9-dihydro-2H-pyrido[2,3-b]indol-2-one 、 、 二苯并-18-冠醚-6 、 sek-Butylperoxyacetat 、 sodium;hydride 在 乙醇 盐酸 、 Sodium sulfate-III 作用下， 以 四氢呋喃 、 乙酸乙酯 为溶剂， 反应 3.0h， 生成 1-[3-(2,4-dichlorophenyl)-1,9-dimethyl-2-oxo-2,9-dihydro-1H-pyrido[2,3-b]indol-6-yl]-4-ethoxybutane-1,3-dione
  参考文献：
  名称：

  6-heteroarylpyridoindolone derivatives, their preparation and therapeutic use thereof

  摘要：

  本公开涉及式(I)的化合物：其中R1、R2、R3、R4和R5如本公开所定义；其制备方法、含有其的组合物以及其治疗用途。

  公开号：

  US08063061B2
• 作为产物：
  描述：

  乙烯酮 、 sec-butyl hydroperoxide 在 硫酸 作用下， 以 正戊烷 为溶剂， 生成 sek-Butylperoxyacetat
  参考文献：
  名称：

  Concerted mechanism and phase effects in decompositions of alkyl peroxy esters

  摘要：

  DOI：

  10.1021/ja00839a048

文献信息

• 6-Heteroarylpyridoindolone Derivatives, Their Preparation and Therapeutic Use Thereof
  申请人：MUNEAUX Yvette

  公开号：US20080262020A1

  公开（公告）日：2008-10-23

  The disclosure relates to compounds of formula (I): wherein R 1 , R 2 , R 3 , R 4 , are R 5 are as defined in the disclosure; their preparation method, compositions containing the same and therapeutic use thereof.

  该公开涉及到式(I)的化合物： 其中R1、R2、R3、R4、R5如本公开所定义；它们的制备方法，含有这些化合物的组合物以及它们的治疗用途。
• CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20190121233A1

  公开（公告）日：2019-04-25

  A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

  一种化学增感型正型光敏树脂组合物，能够抑制“足部”现象的发生，即底部（靠近支撑表面的一侧）的宽度变窄，小于顶部（靠近抗蚀层表面的一侧）的宽度，同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时，能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物，其中包括一个酸发生剂，该酸发生剂在暴露于辐射活性光线或辐射时产生酸，以及一种树脂，在酸的作用下其在碱性溶液中的溶解度增加。
• CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200209739A1

  公开（公告）日：2020-07-02

  A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。
• Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10023540B2

  公开（公告）日：2018-07-17

  To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.

  提供一种能使各种材料具有氢阻隔性能的氢阻隔剂；一种包括该氢阻隔剂的氢阻隔薄膜形成组合物；一种包括该氢阻隔剂的氢阻隔薄膜；一种使用该氢阻隔薄膜形成组合物生产氢阻隔薄膜的方法；以及一种带有该氢阻隔薄膜的电子元件。氢阻隔剂使用了一种具有特定结构的化合物，其中包括咪唑基团。此外，氢阻隔膜形成组合物是通过将上述氢阻隔剂与基础材料成分混合而制备的。此外，使用氢阻隔膜形成组合物形成氢阻隔膜。
• Chemically amplified positive-type photosensitive resin composition
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10054855B2

  公开（公告）日：2018-08-21

  A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1).

  一种光敏树脂组合物，一种使用该组合物制造带有模板的基板的方法，以及一种使用带有模板的基板制造电镀物品的方法。光敏树脂组合物可用于在基底的金属表面形成电镀制品。该组合物包括一种酸发生器，当用活性射线或辐射照射时，该酸发生器会产生一种酸；一种树脂，在酸的作用下，该树脂在碱中的溶解度会增加；以及一种由式（1）表示的芴化合物。