1-methoxy-1-butoxyethane | 75677-94-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-methoxy-1-butoxyethane
• 英文别名: Methyl-n-butyl-acetal；1-(1-methoxy-ethoxy)-butane；1-butoxy-1-methoxy-ethane；Acetaldehyd-methylbutylacetal；1-Butoxy-1-methoxy-aethan；xi-1-Butoxy-1-methoxyethane；1-(1-methoxyethoxy)butane
• CAS: 75677-94-0
• 化学式: C₇H₁₆O₂
• 分子量: 132.203
• InChiKey: DGUULUIJEFJCKG-UHFFFAOYSA-N

物化性质

• 沸点：
  130-131.5 °C
• 密度：
  0.8370 g/cm3
• LogP：
  1.676 (est)

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  9
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  甲醇 、 乙烯基正丁醚 在 metal chloride 作用下， 生成 1-methoxy-1-butoxyethane
  参考文献：
  名称：

  Schosstakowski; Gerstein, Zhurnal Obshchei Khimii, 1946, vol. 16, p. 940,947

  摘要：

  DOI：

文献信息

• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
  申请人：Komoriya Haruhiko

  公开号：US20110244188A1

  公开（公告）日：2011-10-06

  Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

  本发明涉及一种可聚合的含氟单体，其通式（1）如下所示。其中，R1代表氢原子、甲基基团、氟原子或三氟甲基基团。n为0或1的整数，m为1至（3+n）的整数。R2和R3各自独立地代表氢原子或保护基团。通过聚合或共聚合该单体得到的含氟聚合物的抗蚀剂适用于浸润曝光或基于浸润曝光的双重图案化工艺的微细加工。
• Top Coating Composition
  申请人：Maeda Kazuhiko

  公开号：US20120040294A1

  公开（公告）日：2012-02-16

  Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R 1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R 2 represents a heat-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

  本发明公开了一种用于保护光阻膜的顶层涂层组合物，该顶层涂层组合物是一种用于光刻胶的顶层涂层组合物，其特征在于包含具有以下一般式（1）所表示的重复单元的含氟聚合物。该组合物能够控制显影液的溶解性，并具有高度的防水性。[在公式中，R1表示氢原子、氟原子、甲基基团或三氟甲基基团，R2表示热敏保护基团，R3表示氟原子或含氟烷基团，W是双价连接基团。]
• Water Repellent Additive for Immersion Resist
  申请人：Maeda Kazuhiko

  公开号：US20120064459A1

  公开（公告）日：2012-03-15

  Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R 1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R 2 represents a heat-labile protecting group; R 3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.]

  本发明揭示了一种用于浸润抗蚀剂的防水添加剂，该添加剂由具有通式（1）所表示的重复单元的含氟聚合物组成。通过向抗蚀剂组成中添加防水添加剂，可以控制抗蚀剂在曝光期间具有高防水性，并在显影期间在显影液中表现出改善的溶解性。 [在公式中，R1代表氢原子，氟原子，甲基基团或三氟甲基基团；R2代表热敏保护基团；R3代表氟原子或含氟烷基团；W代表双价连接基团。]