A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
提供了一种其阴离子结构中具有酰胺键的新型盐。包含该盐的
化学放大型光刻胶组合物具有许多优点,包括在使用高能辐射(如KrF准分子激光、ArF准分子激光、电子束或EUV)进行光刻加工时,缺陷最小、灵敏度、LWR、MEF和CDU值得到改善。