[EN] NOVEL DIBLOCK COPOLYMER, PREPARATION METHOD THEREOF, AND METHOD OF FORMING NANO PATTERN USING THE SAME<br/>[FR] NOUVEAU COPOLYMÈRE DIBLOCS, SON PROCÉDÉ DE PRÉPARATION, ET PROCÉDÉ DE FORMATION D'UN NANOMOTIF À L'AIDE DE CELUI-CI
申请人:LG CHEMICAL LTD
公开号:WO2012144735A2
公开(公告)日:2012-10-26
The present invention relates to a diblock copolymer that may facilitate formation of a finer nano pattern, and be used for manufacture of an electronic device including a nano pattern or a bio sensor, and the like, a method for preparing the same, and a method for forming a nano pattern using the same, The diblock copolymer comprises a hard segment including at least one specific acrylamide-based repeat unit, and a soft segment including at least one (meth)acrylate-based repeat unit.