4a-(2H)-Naphthalenol, octahydro-8a-methyl-, cis- | 5173-73-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4a-(2H)-Naphthalenol, octahydro-8a-methyl-, cis-
• 英文别名: 8a-methyl-1,2,3,4,5,6,7,8-octahydronaphthalen-4a-ol
• CAS: 5173-73-9；5173-74-0
• 化学式: C₁₁H₂₀O
• 分子量: 168.28
• InChiKey: UWRUMJPLZZBUCM-UHFFFAOYSA-N

物化性质

• 沸点：
  241.6±8.0 °C(Predicted)
• 密度：
  1.020±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

安全信息

• 海关编码：
  2906199090

反应信息

• 作为反应物：
  描述：

  4a-(2H)-Naphthalenol, octahydro-8a-methyl-, cis- 、 乙酰氯 、 N,N-二甲基苯胺 生成 (8a-Methyl-1,2,3,4,5,6,7,8-octahydronaphthalen-4a-yl) acetate
  参考文献：
  名称：

  BLUNT, J. W.;COXON, J. M.;GIBSON, J. R., AUSTRAL. J. CHEM., 1981, 34, N 11, 2469-2473

  摘要：

  DOI：
• 作为产物：
  描述：

  2-(4-iodobutyl)-2-methylcyclohexanone 、 iron(3+);(E)-3-oxo-1,3-diphenylprop-1-en-1-olate 以65%的产率得到
  参考文献：
  名称：

  MOLANDER G. A.; ETTER J. B., J. ORG. CHEM., 51,(1986) N 10, 1778-1786

  摘要：

  DOI：

文献信息

• Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120322006A1

  公开（公告）日：2012-12-20

  A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C 1 -C 3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M + represents a monovalent cation. This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.

  根据本发明，磺酸盐树脂具有以下通用公式（3）的重复单元：其中X分别表示氢原子或氟原子；n表示1至10的整数；R表示氢原子、卤原子或C1-C3烷基或含氟烷基团；J表示二价连接基团；M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐，磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上，因此作为具有良好抗性特性（如DOF、LER、灵敏度和分辨率）的抗性树脂。
• Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：MORI Kazunori

  公开号：US20130065182A1

  公开（公告）日：2013-03-14

  According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

  根据本发明，提供了一种含氟磺酸盐重复单元为以下通式（3）的树脂。为了防止图案形成后的粗糙度或图案形成失败等不足，该含氟磺酸盐树脂具有光酸发生功能，并作为一种抗蚀树脂，其中“能够通过酸作用改变其显影剂溶解性的基团”和“具有光酸发生功能的基团”有规律地排列。
• Polymerizable Fluorine-Containing Compound
  申请人：ISONO Yoshimi

  公开号：US20110098500A1

  公开（公告）日：2011-04-28

  A polymerizable fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  一种可聚合的含氟化合物，其化学式为（1），其中R1表示可聚合的双键含有基团，R2表示酸敏感保护基团，R3表示氟原子或含氟烷基团，W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并包含由式（2）表示的重复单元，其中R2、R3和W如上所述，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物，能够形成透明的曝光光线图案，并具有优异的矩形度。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20080311507A1

  公开（公告）日：2008-12-18

  Disclosed is a fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  本发明涉及一种含氟化合物，其化学式为（1），其中R1代表可聚合的双键含基团，R2代表酸易保护基，R3代表氟原子或含氟烷基团，W代表双价连结基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）所表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可以组成环。该聚合物化合物可提供一种抗蚀剂组合物，能够形成对曝光光线透明且在矩形度方面优越的图案。
• Positive-Type Resist Composition
  申请人：ISONO Yoshimi

  公开号：US20090061353A1

  公开（公告）日：2009-03-05

  Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R 3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W 1 independently represents a bivalent linking group, R 2 represents an acid-labile protecting group, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R 4 , R 5 , R 6 and W or W 1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.

  本发明涉及一种含氟聚合物化合物，其中包含第一和第二重复单元，分别由式（a-1）和（a-2）表示，其中R3表示氟原子或含氟烷基，W和W1各自表示双价连接基团，R2表示酸敏保护基团，R4、R5和R6各自表示氢原子、氟原子或单价有机基团，且式（a-1）或（a-2）中至少两个R4、R5、R6和W或W1可组成环状结构。该聚合物化合物具有1,000至1,000,000的重均分子量，并可提供一种抗膨胀和无图案脱落的光刻胶组合物。