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trans- and cis-1,4-bis(methanesulphonyl)cyclohexane | 38411-73-3

中文名称
——
中文别名
——
英文名称
trans- and cis-1,4-bis(methanesulphonyl)cyclohexane
英文别名
cyclohexane-1,4-diyl dimethanesulfonate;1,4-Bis-(methansulfonoxymethyl)-cyclohexan;Cyclohexane-1,4-diol dimethanesulfonate;(4-methylsulfonyloxycyclohexyl) methanesulfonate
trans- and cis-1,4-bis(methanesulphonyl)cyclohexane化学式
CAS
38411-73-3
化学式
C8H16O6S2
mdl
——
分子量
272.343
InChiKey
VOEWECZIRRCJID-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.4
  • 重原子数:
    16
  • 可旋转键数:
    4
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    104
  • 氢给体数:
    0
  • 氢受体数:
    6

反应信息

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文献信息

  • 77Se,13C and1H NMR spectra of phenylselenenylcycloalkanes, -cycloalkenes and some of their selenoxides and125Te NMR of a tellurium analogue
    作者:Helmut Duddeck、Petra Wagner、Armin Biallaß
    DOI:10.1002/mrc.1260290310
    日期:1991.3
    The 77Se, 13C and 1H NMR spectra of 46 mostly new compounds with phenylselenenyl groups attached to carbocycles and of three new corresponding selenoxides and the 125Te NMR of phenyltellurenylcyclohexane are reported. Substituent effects on the chemical shifts of these nuclei are compiled and discussed in terms of the configuration and conformation. Low-temperature NMR spectra of some cyclohexane derivatives allowed the evaluation of thermodynamic data, such as A values of the PhSe, PhSe(O) and PhTe groups.
    报道了46个主要为新化合物(具有连接到碳环上的苯基亚硒基团)以及三个新的相应亚硒氧化物的77Se、13C和1H NMR光谱,以及苯基碲基环己烷的125Te NMR光谱。根据构型和构象,对这些核的化学位移的取代基效应进行了汇编和讨论。一些环己烷衍生物的低温NMR光谱使得能够评估热力学数据,例如PhSe、PhSe(O)和PhTe基团的A值。
  • SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY
    申请人:Nissan Chemical Industries, Ltd.
    公开号:EP1813987A1
    公开(公告)日:2007-08-01
    There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
    本发明提供了一种用于光刻的抗反射涂层形成组合物,该组合物由聚合物化合物、交联化合物、交联催化剂、磺酸盐化合物和溶剂组成。由该组合物制得的抗反射涂层对反射光有很好的防止效果,不会与光刻胶混合,与光刻胶相比具有更高的干蚀刻率,可以形成下部无基底的光刻胶图案,并可在光刻工艺中使用 ArF 准分子激光束和 F2 准分子激光束等光源。
  • Compounds as LRRK2 kinase inhibitors
    申请人:GLAXOSMITHKLINE INTELLECTUAL PROPERTY DEVELOPMENT LIMITED
    公开号:US10087186B2
    公开(公告)日:2018-10-02
    The present invention relates to novel compounds that inhibit LRRK2 kinase activity, processes for their preparation, to compositions containing them and to their use in the treatment of or prevention of diseases characterized by LRRK2 kinase activity, for example Parkinson's disease, Alzheimer's disease and amyotrophic lateral sclerosis (ALS).
    本发明涉及抑制 LRRK2 激酶活性的新型化合物、其制备工艺、含有这些化合物的组合物以及它们在治疗或预防以 LRRK2 激酶活性为特征的疾病(例如帕金森病、阿尔茨海默病和肌萎缩性脊髓侧索硬化症(ALS))中的用途。
  • LRRK2 inhibitors for the treatment of Parkinson's disease
    申请人:GlaxoSmithKline Intellectual Property Development Limited
    公开号:US10618901B2
    公开(公告)日:2020-04-14
    The present invention relates to novel compounds that inhibit LRRK2 kinase activity, processes for their preparation, to compositions containing them and to their use in the treatment of or prevention of diseases characterized by LRRK2 kinase activity, for example Parkinson's disease, Alzheimer's disease and amyotrophic lateral sclerosis (ALS).
    本发明涉及抑制 LRRK2 激酶活性的新型化合物、其制备工艺、含有这些化合物的组合物以及它们在治疗或预防以 LRRK2 激酶活性为特征的疾病(例如帕金森病、阿尔茨海默病和肌萎缩性脊髓侧索硬化症(ALS))中的用途。
  • EP0918781A4
    申请人:——
    公开号:EP0918781A4
    公开(公告)日:1999-07-28
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