High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components
申请人:Kabushiki Kaisha Toshiba
公开号:US20030235781A1
公开(公告)日:2003-12-25
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):
1
(wherein R is an alicyclic skeleton; at least one of R
x1
s is an electron-withdrawing group, the residual R
x1
s being the same or different and being individually a hydrogen atom or monovalent organic group; with the proviso that R may contain a heteroatom, and that R and R
x1
may be combined to form a ring; at least one of R
x1
s is an electron-withdrawing group, the residual R
x1
s being the same or different and being individually a hydrogen atom or monovalent organic group; R
2
s may be the same or different and are individually a hydrogen atom or monovalent organic group; and n is an integer ranging from 2 to 25; with the proviso that at least two carbon atoms selected from carbon atoms constituting R
2
and carbon atoms to which the R
2
s are connected may be combined to form a condensed ring).
本发明公开了一种用于光刻胶的聚合物化合物,其特征在于该聚合物化合物是由至少一个骨架由以下通式(1)、通式(2A)、通式(2B)或通式(2C)表示的聚合物化合物形成的:
1
(其中 R 为脂环族骨架;R
x1
中至少有一个是取电子基团,残余 R
x1
s 相同或不同,且各自为氢原子或单价有机基团;但 R 可含有一个杂原子,且 R 和 R
x1
可组合成一个环;R
x1
中至少有一个是抽电子基团,残余的 R
x1
s 相同或不同,且各自为氢原子或单价有机基团;R
2
s 可以相同或不同,且各自为氢原子或一价有机基团;n 为 2 至 25 之间的整数;但至少有两个碳原子选自构成 R 2
2
的碳原子和 R
2
s 连接的碳原子中选出的至少两个碳原子可结合形成一个缩合环)。