申请人:WAKO PURE CHEMICAL INDUSTRIES LTD
公开号:EP0476865A1
公开(公告)日:1992-03-25
A resist material of chemical amplified type comprising (a) a polymer such as a polymer of 1-methylcycloalkyl 4-ethenylphenoxyacetate and 4-hydroxystyrene, etc., (b) a photo-sensitive compound capable of generating an acid when exposed to light, and (c) a solvent for dissolving both the components (a) and (b) is excellent in heat resistance and adhesiveness to substrates, capable of maintaining stable pattern dimension from exposure to light to heat treatment, and capable of forming patterns using deep ultraviolet light, KrF excimer laser light, etc.
一种化学放大型抗蚀剂材料,包括(a)聚合物,如 1-甲基环烷基 4-乙烯基苯氧乙酸酯和 4-羟基苯乙烯等的聚合物、(c) 用于溶解(a)和(b)两种成分的溶剂。这种抗蚀剂具有优异的耐热性和与基材的粘合性,从受光到热处理都能保持稳定的图案尺寸,并能使用深紫外线、KrF 准分子激光等形成图案。