[3,5-双(羟甲基)环己基]甲醇 | 5962-82-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 中文名称: [3,5-双(羟甲基)环己基]甲醇
• 中文别名: 1,3,5-环己烷三甲醇
• 英文名称: 1,3,5-trihydroxycyclohexane
• 英文别名: (3,5-bis-hydroxymethyl-cyclohexyl)-methanol；1,3,5-cyclohexane-tris-methanol；1,3,5-trimethylolcyclohexane；1,3,5-Tris-hydroxymethyl-cyclohexan；1,3,5-Trihydroxymethylcyclohexan；1,3,5-Cyclohexanetrimethanol；[3,5-bis(hydroxymethyl)cyclohexyl]methanol
• CAS: 5962-82-3
• 化学式: C₉H₁₈O₃
• 分子量: 174.24
• InChiKey: GTVHYMGRLVPCJJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  [3,5-双(羟甲基)环己基]甲醇 以63%的产率得到
  参考文献：
  名称：

  NIELSEN A. T.; CHRISTIAN S. L.; MOORE D. W.; GILARDI R. D.; GEORGE C. F., J. ORG. CHEM., 52,(1987) N 9, 1656-1662

  摘要：

  DOI：
• 作为产物：
  描述：

  1,3,5-triacetoxymethylcyclohexane 在 盐酸 、 水 作用下， 以 乙醇 为溶剂， 以100%的产率得到[3,5-双(羟甲基)环己基]甲醇
  参考文献：
  名称：

  WO2007/133090

  摘要：

  公开号：

文献信息

• Liquid epoxy compound and process for preparing the same
  申请人：——

  公开号：US20030135059A1

  公开（公告）日：2003-07-17

  A liquid trifunctional epoxy compound with a total chlorine content of 100 ppm or less represented by general formula (1) is obtained by epoxidizing a triallyl ether represented by general formula (2) with a peroxide and the liquid epoxy compound is useful as a diluent in a variety of applications, particularly useful as a liquid encapsulating material in electronic applications: R[—(OCH 2 CH 2 ) n —OG] 3 (1) R[—(OCH 2 CH 2 ) n —O—CH 2 —CH═CH 2 ] 3 (2) (wherein R is a trivalent hydrocarbon group in which 3 different carbon atoms participate in bond formation or, more particularly, a straight-chain or branched hydrocarbon group containing 3-10 carbon atoms, a cycloalkane group containing 6 carbon atoms or a hydrocarbon group containing 7-20 carbon atoms and consisting of hydrocarbon chains and cycloalkane rings, n is 0, 1, or 2 and G is glycidyl group).

  一种总氯含量为100 ppm或更少的液态三官能团环氧化合物，由通式（1）表示，通过用过氧化物对通式（2）表示的三烯基醚进行环氧化反应而得到，该液态环氧化合物可用作各种应用中的稀释剂，尤其是在电子应用中作为液体封装材料特别有用：R-[（OCH2CH2）n]-OG3（1），R-[（OCH2CH2）n]-O-CH2-CH（CH3）2 3（2）（其中，R是三价的碳氢基团，其中3个不同的碳原子参与键形成，或更具体地说，是含有3-10个碳原子的直链或支链碳氢基团，含有6个碳原子的环烷基团或含有7-20个碳原子的碳氢基团，由碳氢链和环烷环组成，n为0,1或2，G是环氧丙基基团）。
• Radiation curable compositions containing multifunctional vinyl ether
  申请人：ISP Investments Inc.

  公开号：US05106885A1

  公开（公告）日：1992-04-21

  What is provided herein are radiation curable compositions containing (a) multifunctional vinyl ether monomers having the formula: X--R.sub.1 --Y.sub.1 --R.sub.2 --Y.sub.2).sub.n CH.dbd.CH.sub.2 ].sub.m where X is a 5-8 membered ring, saturated or unsaturated; R.sub.1 is a direct bond or C.sub.1 -C.sub.10 straight or branched chain alkylene; Y.sub.1 and Y.sub.2 are independently oxygen or sulfur; R.sub.2 is C.sub.2 -C.sub.10 straight or branched chain alkylene; n is 0-10; and m is 3-5; (b) a cationic initiator, and, optionally, (c) a polymerizable vinyl ether, epoxide, or acrylate oligomer.

  所提供的是可辐射固化组合物，其中包含(a)多功能乙烯基醚单体，其化学式为：X--R.sub.1 --Y.sub.1 --R.sub.2 --Y.sub.2).sub.n CH.dbd.CH.sub.2 ].sub.m，其中X为5-8成员环，饱和或不饱和；R.sub.1为直接键或C.sub.1-C.sub.10直链或支链烷基；Y.sub.1和Y.sub.2独立地为氧或硫；R.sub.2为C.sub.2-C.sub.10直链或支链烷基；n为0-10；m为3-5；(b)阳离子引发剂，可选地，(c)可聚合的乙烯基醚，环氧化合物或丙烯酸酯寡聚体。
• (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：——

  公开号：US20010026901A1

  公开（公告）日：2001-10-04

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: 1 wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本发明公开了一种用于使用220纳米或更短波长的光进行光刻的光阻材料，其包括至少一种由以下式（2）表示的聚合物和用于通过曝光产���酸的光酸发生剂： 其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸可裂解基团、具有7至13个碳原子的脂环烃基团，其具有酸可裂解基团、具有7至13个碳原子的脂环烃基团，其具有羧基，或具有3至13个碳原子的烃基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的烃基团，或具有7至13个碳原子的脂环烃基团，其具有羧基；x、y和z是可选的值，满足x+y+z=1，0≤x≤1，0≤y<1和0≤z<1；聚合物的重均分子量在2000至200000范围内，以及具有由式（3）表示的脂环内酯结构的（甲）丙烯酸酯单元的树脂： 其中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的烃基团。
• Method of producing a crosslinked coating in the manufacture of integrated circuits
  申请人：Hessell T. Edward

  公开号：US20050215713A1

  公开（公告）日：2005-09-29

  The present invention is directed to a method of providing a thermally curable coating composition for to provide positive photoresists layers, underlayers for multiple layer resists, antireflective coatings, bottom layer antireflective coatins, dielectric layers, photoresist layers, hard mask etch stops, in the manufacture of integrated circuits. More particularly, the present invention is directed to a method of using a thermally activable latent acid or a thermal acid generator, a N-benzylpyridinium or N-benzylanilinium salt of a strong acid, as a catalyst in a polymerizable composition suitable for preparing such coatings and layers. The present invention is also directed to novel compositions comprising benzylpyridinium and benzylanilinium salts of a strong acid, such as sulfonic acid or disulfonic acid as thermal acid generators.

  本发明涉及一种提供热固性涂层组合物的方法，用于提供正向光刻层、多层光刻底层、抗反射涂层、底层抗反射涂层、介电层、光刻层、硬膜层刻停等，用于集成电路的制造。更具体地，本发明涉及一种使用热活性潜酸或热酸发生剂、强酸的N-苄基吡啶或N-苄基苯胺盐作为催化剂的聚合物组合物的方法，适用于制备这种涂层和层。本发明还涉及一种新型组合物，包括苄基吡啶和苄基苯胺盐，作为热酸发生剂的强酸，如磺酸或二磺酸。
• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0