1,1,2,3,3-Pentafluoro-4-(methoxymethoxy)-4-(trifluoromethyl)hepta-1,6-diene | 448220-62-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,1,2,3,3-Pentafluoro-4-(methoxymethoxy)-4-(trifluoromethyl)hepta-1,6-diene
• CAS: 448220-62-0
• 化学式: C₁₀H₁₀F₈O₂
• 分子量: 314.175
• InChiKey: DKJGDNFDFLSOJI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  20
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  10

反应信息

• 作为产物：
  描述：

  6,7-dichloro-5,5,6,7,7-pentafluoro-4-(methoxymethoxy)-4-(trifluoromethyl)hept-1-ene 在 碘 、 锌 作用下， 以 1,4-二氧六环 为溶剂， 反应 49.0h， 生成 1,1,2,3,3-Pentafluoro-4-(methoxymethoxy)-4-(trifluoromethyl)hepta-1,6-diene
  参考文献：
  名称：

  FLUORINE-CONTAINING COMPOUNDS AND POLYMERS AND PROCESSES FOR PRODUCING THE SAME

  摘要：

  公开号：

  EP1367071B1

文献信息

• Resist composition
  申请人：Kawaguchi Yasuhide

  公开号：US20050202345A1

  公开（公告）日：2005-09-15

  A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F 2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

  提供了一种抗蚀性组合物，该组合物可以轻松形成透明度优异的抗真空紫外线（例如F2准分子激光器）或干法刻蚀特性，并且在灵敏度、分辨率、平整度、耐热性等方面也具有优异的抗蚀性图案。该抗蚀性组合物的特征在于包含（A）一种含有具有环烷基、一个或多个环烷基或双环烷基等有机基团的阻断基的酸性基团的氟含量高的聚合物，（B）一种能够通过光辐射产生酸的酸发生化合物，以及（C）一种有机溶剂。
• Fluoropolymer
  申请人：Kawaguchi Yasuhide

  公开号：US20050209409A1

  公开（公告）日：2005-09-22

  To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF 2 ═CFCF 2 —C(CF 3 )(R 5 )—CH 2 CH═CH 2 (3) wherein R 5 is either a hydroxyl group blocked by —CHR 7 —O—R 8 or an organic group having the hydroxyl group, and R 8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

  提供一种适用于250nm或更短波长准分子激光光刻材料的基础聚合物的氟聚合物。该氟聚合物具有由以下化学式(3)表示的氟化二烯化合物的环聚合物单体单元，CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2(3)其中，R5为通过—CHR7—O—R8阻断的羟基基团或具有羟基基团的有机基团，R8为环状饱和碳氢化合物，例如可能具有取代基团的环烷基团，或具有环状饱和碳氢化合物的有机基团。
• FLUOROPOLYMER
  申请人：ASAHI GLASS COMPANY LTD.

  公开号：EP1559729A1

  公开（公告）日：2005-08-03

  To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),         CF2=CFCF2-C(CF3) (R5)-CH2CH=CH2     (3) wherein R5 is either a hydroxyl group blocked by -CHR7-O-R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

  提供一种氟聚合物，适合用作波长为 250 nm 或更短的准分子激光的抗蚀剂材料的基础聚合物。 一种含氟聚合物，其单体单元是由下式（3）所代表的氟化二烯化合物环聚合而成、 cf2=cfcf2-c(cf3) (r5)-ch2ch=ch2 (3) 其中 R5 是被-CHR7-O-R8 封端的羟基或具有该羟基的有机基团，R8 是环状饱和烃，如可能具有取代基的环烷基，或具有该环状饱和烃的有机基团。
• RESIST COMPOSITION
  申请人：ASAHI GLASS COMPANY LTD.

  公开号：EP1580600A1

  公开（公告）日：2005-09-28

  A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

  本发明提供了一种抗蚀剂组合物，该抗蚀剂组合物可以很容易地形成对 F2 准分子激光等真空紫外线具有优异透明度和干蚀刻特性的抗蚀图案，而且在灵敏度、分辨率、平整度、耐热性等方面也具有优异的性能。 这种抗蚀剂组合物的特点是：(A) 含氟聚合物，其酸性基团被含有环烷基的封端基团、具有一个或多个环烷基的有机基团、双环烷基或类似基团的封端基团封住；(B) 酸生成化合物，能够通过光照射生成酸；(C) 有机溶剂。
• FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME
  申请人：ASAHI GLASS COMPANY LTD.

  公开号：EP1657264A1

  公开（公告）日：2006-05-17

  To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluorinated copolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene represented by the following formula (1) :         CF2=CFCH2CH(CH2C(CF3)2(OR1)) CH2CH=CH2     (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH2R2 (wherein R2 is an alkoxycarbonyl group having at most 6 carbon atoms), and units derived from a monomer unit formed by cyclopolymerization of another monomer or units derived from a monomer unit formed by polymerization of an acrylic monomer, and a resist composition having such a fluorinated copolymer as a base polymer.

  提供一种具有官能团且在宽波长区域具有高透明度的含氟聚合物，以及一种包含该含氟聚合物的抗蚀剂组合物。 一种含氟共聚物，其单元来自由下式（1）代表的含氟二烯环聚合形成的单体单元： cf2=cfch2ch(ch2c(cf3)2(or1)) ch2ch=ch2 (1) 其中 R1 是氢原子、具有至多 20 个碳原子的烷基（可具有一个醚氧原子）、具有至多 6 个碳原子的烷氧羰基或 CH2R2（其中 R2 是具有至多 6 个碳原子的烷氧羰基），以及由另一种单体环聚合形成的单体单元衍生的单元或由丙烯酸单体聚合形成的单体单元衍生的单元，以及以这种含氟共聚物为基础聚合物的抗蚀剂组合物。