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Tripropylenglycol-monoallylaether-Caesiumsalz | 102082-91-7

中文名称
——
中文别名
——
英文名称
Tripropylenglycol-monoallylaether-Caesiumsalz
英文别名
Tripropylenglykol-monoallylether, Caesium-Salz;1-[2-(2-allyloxy-1-methyl-ethoxy)-1-methyl-ethoxy]-propan-2-ol;1-[1-(1-Prop-2-enoxypropan-2-yloxy)propan-2-yloxy]propan-2-ol
Tripropylenglycol-monoallylaether-Caesiumsalz化学式
CAS
102082-91-7
化学式
C12H24O4
mdl
——
分子量
232.32
InChiKey
CEYWPSGEISUBHO-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1
  • 重原子数:
    16
  • 可旋转键数:
    10
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.83
  • 拓扑面积:
    47.9
  • 氢给体数:
    1
  • 氢受体数:
    4

反应信息

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文献信息

  • SULPHURATED DERIVATIVES OF RESORCINOL, PREPARATION OF SAME AND COSMETIC USES THEREOF
    申请人:Poigny Stéphane
    公开号:US20120034176A1
    公开(公告)日:2012-02-09
    The present invention relates to a compound of the general formula (I) where: X═S, SO or SO 2 ; and one of the radicals R 1 and R 2 is a hydrogen atom and the other is a radical: a C 1 to C 18 linear or branched alkyl, optionally substituted by one or more halogen atom(s); a C 2 to C 18 linear or branched alkenyl, optionally substituted by one or more halogen atom(s); an aralkyl, optionally substituted by one or more C 1 to C 6 alkoxy group(s); or a COR 3 or CONHR 3 , but not simultaneously, where R 3 is a radical: a C 1 to C 18 linear or branched alkyl, optionally substituted by one or more halogen atom(s); a C 2 to C 18 linear or branched alkenyl, optionally substituted by one or more halogen atom(s); an aralkyl, optionally substituted by one or more C 1 to C 6 alkoxy group(s); an aralkenyl, optionally substituted by one or more C 1 to C 6 alkoxy groups and/or one or more OH group(s); or an aryl radical, optionally substituted by one or more C 1 to C 6 alkoxy group(s).
    本发明涉及一种通式(I)的化合物,其中:X═S、SO或SO2;而R1和R2中的一个是氢原子,另一个是以下基团之一:一种C1到C18直链或支链烷基,可选择地被一个或多个卤原子取代;一种C2到C18直链或支链烯烃,可选择地被一个或多个卤原子取代;一种芳基烷基,可选择地被一个或多个C1到C6烷氧基取代;或者COR3或CONHR3,但不是同时,其中R3是以下基团之一:一种C1到C18直链或支链烷基,可选择地被一个或多个卤原子取代;一种C2到C18直链或支链烯烃,可选择地被一个或多个卤原子取代;一种芳基烷基,可选择地被一个或多个C1到C6烷氧基取代;一种芳基烯烃,可选择地被一个或多个C1到C6烷氧基和/或一个或多个羟基取代;或者一种芳基基团,可选择地被一个或多个C1到C6烷氧基取代。
  • COMPOSITIONS AND METHOD FOR TREATING A COPPER SURFACE
    申请人:RADZEWICH Catherine E.
    公开号:US20090068846A1
    公开(公告)日:2009-03-12
    The present invention is directed to compositions for copper passivation and methods of use of such compositions.
    本发明涉及用于铜钝化的组合物以及使用这些组合物的方法。
  • TRANSPARENT COMPOSITE MATERIAL
    申请人:Toita Ryoji
    公开号:US20120022191A1
    公开(公告)日:2012-01-26
    This invention relates to a transparent composite material having a low coefficient of liner thermal expansion and excellent transparency and flexibility, which is formed by curing a resin composition containing urethane (meth)acrylate, in which 10 to 40% by mass of synthetic smectite that is organized with a quaternary ammonium salt and/or a quaternary phosphonium salt and has a number average particle diameter of from 10 to 300 nm and an aspect ratio of from 10 to 300 is dispersed; and a transparent composite sheet using the material.
    本发明涉及一种透明的复合材料,具有低线性热膨胀系数和优异的透明度和柔韧性,该材料由固化含有脲基(甲基)丙烯酸酯的树脂组合物形成,其中分散了10至40重量%的合成粘土,该合成粘土是由季铵盐和/或季膦盐组成的,并且具有平均粒径为10至300 nm和纵横比为10至300;以及使用该材料的透明复合板。
  • Composition and method for cleaning gas turbine compressors
    申请人:THE DOW CHEMICAL COMPANY
    公开号:EP0275987A2
    公开(公告)日:1988-07-27
    Gas turbine compressors are cleaned during power generation (on line) by periodically injecting or spraying into the air inlet, a cleaning composition comprising 4 to 95 percent by weight of a glycol ether or a mixture of glycol ethers, 0.1 to 14 percent by weight of a nonionic surfactant, 0.01 to 6 percent by weight of a cationic surfactant, and 0 to 95 percent by weight of purified water.
    燃气涡轮压缩机在发电期间(在线)通过定期向进气口注入或喷洒清洁组合物进行清洁,该组合物包括 4% 至 95% (重量百分比)的乙二醇醚或乙二醇醚混合物、0.1% 至 14% (重量百分比)的非离子表面活性剂、0.01% 至 6% (重量百分比)的阳离子表面活性剂和 0% 至 95% (重量百分比)的纯净水。
  • Stripping compositions and method of stripping resists from substrates
    申请人:EKC TECHNOLOGY, INC.
    公开号:EP0485161A1
    公开(公告)日:1992-05-13
    A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
    本文描述了一种用于从含有羟胺和至少一种烷醇胺的基底上去除抗蚀剂的剥离组合物。剥离组合物中还可加入一种或多种极性溶剂。该剥离组合物尤其适用于在半导体集成电路制造过程中从基底上剥离光阻,以及剥离固化的聚合物涂层,如聚酰亚胺涂层。
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