1,4-Bis[(chloromethoxy)methyl]cyclohexane | 7093-34-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,4-Bis[(chloromethoxy)methyl]cyclohexane
• 英文别名: 1,4-bis(chloromethoxymethyl)cyclohexane
• CAS: 7093-34-7
• 化学式: C₁₀H₁₈Cl₂O₂
• 分子量: 241.15
• InChiKey: GFGSTGXIQKECNR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  14
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Echigo Masatoshi

  公开号：US20130122423A1

  公开（公告）日：2013-05-16

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided.

  本发明的目的是提供一种在安全溶剂中具有高溶解度和高灵敏度的化合物，同时还能获得良好的抗蚀图案形状，包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。为此，提供了通过多酚基环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2599814A1

  公开（公告）日：2013-06-05

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. The solving means are a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition.

  本发明的目的是提供一种在安全溶剂中具有高溶解性和高灵敏度并能获得良好抗蚀剂图案形状的化合物、一种含有该化合物的辐射敏感组合物以及一种使用该组合物的抗蚀剂图案形成方法。 解决方法是由基于多酚的环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），含有该化合物的辐射敏感性组合物，以及使用该组合物的抗蚀剂图案形成方法。
• POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1736485B1

  公开（公告）日：2013-07-31
• Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern
  申请人：Ogata Toshiyuki

  公开号：US20070224520A1

  公开（公告）日：2007-09-27

  A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH 2 —O-A O—CH 2 —] n (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
• COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Shiono Daiju

  公开号：US20090081580A1

  公开（公告）日：2009-03-26

  A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.