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21,40-Dibromo-7,14,25,32-tetrazaundecacyclo[21.13.2.22,5.03,19.04,16.06,14.08,13.020,37.024,32.026,31.034,38]tetraconta-1(37),2(40),3(19),4(16),5(39),6,8,10,12,17,20,22,24,26,28,30,34(38),35-octadecaene-15,33-dione | 956135-85-6

中文名称
——
中文别名
——
英文名称
21,40-Dibromo-7,14,25,32-tetrazaundecacyclo[21.13.2.22,5.03,19.04,16.06,14.08,13.020,37.024,32.026,31.034,38]tetraconta-1(37),2(40),3(19),4(16),5(39),6,8,10,12,17,20,22,24,26,28,30,34(38),35-octadecaene-15,33-dione
英文别名
——
21,40-Dibromo-7,14,25,32-tetrazaundecacyclo[21.13.2.22,5.03,19.04,16.06,14.08,13.020,37.024,32.026,31.034,38]tetraconta-1(37),2(40),3(19),4(16),5(39),6,8,10,12,17,20,22,24,26,28,30,34(38),35-octadecaene-15,33-dione化学式
CAS
956135-85-6
化学式
C36H14Br2N4O2
mdl
——
分子量
694.341
InChiKey
VNHQNPRZIYSGOA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    8.7
  • 重原子数:
    44
  • 可旋转键数:
    0
  • 环数:
    11.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    69.8
  • 氢给体数:
    0
  • 氢受体数:
    4

文献信息

  • METHOD FOR PRODUCING ORGANIC FIELD-EFFECT TRANSISTORS
    申请人:Konemann Martin
    公开号:US20070259475A1
    公开(公告)日:2007-11-08
    A method for producing an organic field-effect transistor, comprising the steps of: a) providing a substrate comprising a gate structure, a source electrode and a drain electrode located on the substrate, and b) applying an n-type organic semiconducting compound to the area of the substrate where the gate structure, the source electrode and the drain electrode are located, wherein the n-type organic semiconducting compound is selected from the group consisting of compounds of the formula I wherein R 1 , R 2 , R 3 and R 4 are independently hydrogen, chlorine or bromine, with the proviso that at least one of these radicals is not hydrogen, Y 1 is O or NR a , wherein R a is hydrogen or an organyl residue, Y 2 is O or NR b , wherein R b is hydrogen or an organyl residue, Z 1 , Z 2 , Z 3 and Z 4 are O, where, in the case that Y 1 is NR a , one of the residues Z 1 and Z 2 may be a NR c group, where R a and R c together are a bridging group having 2 to 5 atoms between the terminal bonds, where, in the case that Y 2 is NR b , one of the residues Z 3 and Z 4 may be a NR d group, where R b and R d together are a bridging group having 2 to 5 atoms between the terminal bonds.
  • US7910736B2
    申请人:——
    公开号:US7910736B2
    公开(公告)日:2011-03-22
  • [EN] METHOD FOR PRODUCING ORGANIC FIELD-EFFECT TRANSISTORS<br/>[FR] PROCÉDÉ DE PRODUCTION DE TRANSISTORS À EFFET DE CHAMP ORGANIQUES
    申请人:BASF AG
    公开号:WO2007128774A1
    公开(公告)日:2007-11-15
    [EN] A method for producing an organic field-effect transistor, comprising the steps of: a) providing a substrate comprising a gate structure, a source electrode and a drain electrode located on the substrate, and b) applying an n-type organic semiconducting compound to the area of the substrate where the gate structure, the source electrode and the drain electrode are located, wherein the n-type organic semiconducting compound is selected from the group consisting of compounds of the formula (I) wherein R1, R2, R3 and R4 are independently hydrogen, chlorine or bromine, with the proviso that at least one of these radicals is not hydrogen, Y1 is O or NRa, wherein Ra is hydrogen or an organyl residue, Y2 is O or NRb, wherein Rb is hydrogen or an organyl residue, Z1, Z2, Z3 and Z4 are O, where, in the case that Y1 is NRa, one of the residues Z1 and Z2 may be a NRc group, where Ra and Rc together are a bridging group having 2 to 5 atoms between the terminal bonds, where, in the case that Y2 is NRb, one of the residues Z3 and Z4 may be a NRd group, where Rb and Rd together are a bridging group having 2 to 5 atoms between the terminal bonds.
    [FR] La présente invention concerne un procédé de production d'un transistor à effet de champ organique. A cet effet, a) on prend un substrat comprenant une structure de grille, une électrode source, et une électrode collectrce située sur le substrat, et b) un applique un composé organique semiconducteur de type n sur la zone du substrat occupée par la structure de grille, l'électrode source, et l'électrode collectrice. En l'occurrence, le composé organique semiconducteur de type n est choisi dans un groupe constitué de composés représentés par la formule (I). Dans cette formule, R1, R2, R3 et R4 sont indépendamment hydrogène, chlore ou brom (à la condition que l'un au moins de ces radicaux ne soit pas hydrogène). Y1 est O ou NRa, Ra étant hydrogène ou un résidu organyle. Y2 est O ou NRb, Rb étant hydrogène ou un résidu organyle. Z1, Z2, Z3 et Z4 sont O. Toutefois, si Y1 est NRa, l'un des résidus Z1 et Z2 peut être un groupe NRc dans lequel Ra et Rc forment ensemble un groupe en pont portant 2 à 5 atomes entre les liaisons terminale bonds. En outre, su Y2 est NRb, l'un des résidus Z3 et Z4 peut être un groupe NRd group. Et enfin, Rb et Rd forment ensemble un groupe en pont portant 2 à 5 atomes entre les liaisons terminales.
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