METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND
申请人:ADEKA CORPORATION
公开号:US20150175642A1
公开(公告)日:2015-06-25
Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R
1
represents a methyl group or an ethyl group, R
2
represents a hydrogen atom or a methyl group, R
3
represents a C
1-3
linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
揭示了一种具有适合用于CVD形成薄膜材料的物理性质的金属烷氧化物化合物,特别是一种具有适合用于形成金属铜薄膜材料的金属烷氧化物化合物。金属烷氧化物化合物由通式(I)表示。还描述了包括金属烷氧化物化合物的薄膜形成材料。(在公式中,R1代表甲基基团或乙基基团,R2代表氢原子或甲基基团,R3代表C1-3直链或支链烷基基团,M代表金属原子或硅原子,n代表金属原子或硅原子的价。