CATALYTIC ENANTIOSELECTIVE SILYLATIONS OF SUBSTRATES
申请人:Hoveyda Amir H.
公开号:US20090312559A1
公开(公告)日:2009-12-17
The present invention provides methods, compositions and systems for silylation of substrates, including direct asymmetric silylation of a substrate to provide enantiomerically enriched silylated products.