A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1:
wherein R
1
, R
2
, R
3
, A, X, Y, n and m are as defined in the specification.
The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.
提供了一种新型光敏化合物。该光敏化合物的结构如公式1所示:其中,R1、R2、R3、A、X、Y、n和m的定义如规范中所述。该光敏化合物能够高效吸收紫外线。因此,该光敏化合物具有改善产生自由基的能力,并且能够高效光聚合不饱和键。此外,还提供了一种包括该光敏化合物的光敏
树脂组合物。该光敏
树脂组合物具有良好的敏感性,因为它能够高效吸收紫外线。此外,该光敏
树脂组合物在残留膜比、机械强度、耐热性、耐
化学品和开发方面具有优异的特性。因此,该光敏
树脂组合物可以优势地用于液晶显示器件的柱间距材料、覆盖层和钝化膜的固化材料。此外,该光敏
树脂组合物具有优异的热加工特性。