β,γ-dimethyl-β-methacryloyloxy-γ-butyrolactone

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: β,γ-dimethyl-β-methacryloyloxy-γ-butyrolactone
• 英文别名: 2,3-Dimethyl-5-oxotetrahydrofuran-3-yl methacrylate；(2,3-dimethyl-5-oxooxolan-3-yl) 2-methylprop-2-enoate
• 化学式: C₁₀H₁₄O₄
• 分子量: 198.219
• InChiKey: VRVJALFOECGRKH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  乙烯酮 、 2-methacrylate of butan-3-one 在 三氟化硼乙醚 作用下， 以 乙酸乙酯 为溶剂， 反应 4.5h， 以40.9%的产率得到β,γ-dimethyl-β-methacryloyloxy-γ-butyrolactone
  参考文献：
  名称：

  METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES

  摘要：

  这项艺术涉及提供一种用于制造（甲基）丙烯酸酯聚合单体的方法，该单体可用于各种应用，如光学材料、抗蚀材料、涂料和层压材料，并通过应用该制造方法提供一种新的β-(甲基)丙烯酰氧基-γ-丁内酯化合物。描述了制造β-(甲基)丙烯酰氧基-γ-丁内酯化合物的方法，其中将具有羰基的（甲基）丙烯酸酯化合物与酮烯化合物进行缩合和异构化。此外，该制造方法应用于新的β-(甲基)丙烯酰氧基-γ-丁内酯化合物。

  公开号：

  US20150126753A1

文献信息

• HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160238930A1

  公开（公告）日：2016-08-18

  A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.

  从具有以下式（1a）的半缩醛化合物获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2至R4分别为H或单价碳氢基团，X1为二价碳氢基团，ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环，k1=0或1，k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。
• Polymeric compound and resin composition for photoresist
  申请人：——

  公开号：US20020169266A1

  公开（公告）日：2002-11-14

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1 The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to 2 wherein R 1 , R 13 , R 14 and R 15 are each a hydrogen atom or methyl group; R 2 and R 3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R 4 , R 5 and R 6 are each a hydrogen atom, hydroxyl group or a methyl group; R 7 and R 8 are each a hydrogen atom, hydroxyl group or —COOR 9 group, where R 9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R 10 and R 11 are each a hydrogen atom, hydroxyl group or oxo group; R 12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R 16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光阻聚合物化合物包括以下式(I)所表示的单体单元：1该聚合物化合物还可以包括以下式(IIa)至(IIb)所表示的至少一种单体单元中的至少一种：其中，R1、R13、R14和R15均为氢原子或甲基基团；R2和R3均为具有1至8个碳原子的碳氢基团；R4、R5和R6均为氢原子、羟基或甲基基团；R7和R8均为氢原子、羟基或-COOR9基团，其中R9为叔丁基基团、2-四氢呋喃基团等；R10和R11均为氢原子、羟基或酮基；R12为具有在公式中指示的氧原子与三级碳原子成键位的碳氢基团；R16为叔丁基基团、2-四氢呋喃基团等；n表示1至3的整数。该光阻聚合物化合物可以表现出对基材的高粘附性，并可以高精度地形成细小图案。
• 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
  申请人：——

  公开号：US20040248031A1

  公开（公告）日：2004-12-09

  The 5-methylene-1,3-dioxolan-4-one derivative of the present invention is represented by the formula (1) indicated below, and it is a novel monomer from which a homopolymer and a copolymer excellent in light transparency and heat stability are obtained. Moreover, the polymer obtained by (co)polymerizing a monomer composition comprising the derivative represented by the formula (1) indicated below is excellent in the resist performance such as sensitivity, resolution and dry etching resistance, and solubility in an organic solvent, also having little line edge roughness, and thus it is preferably used as a resin for a resist composition. 1 wherein R 1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R 2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R 1 and R 2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.

  本发明的5-亚甲基-1,3-二氧杂环戊酮衍生物的化学式如下所示，是一种新型单体，可制备出具有优异光透明度和热稳定性的均聚物和共聚物。此外，通过聚合由下式表示的衍生物组成的单体混合物得到的聚合物具有优异的感光性、分辨率、干法蚀刻抗性和有机溶剂溶解性，同时具有较小的线边粗糙度，因此它可作为光刻胶组分的树脂。其中，R1代表含有4到16个碳原子的桥环烃基，或含有4到16个碳原子的桥环烃基作为取代基的线性或支链烷基，R2代表氢原子，或含有1到6个碳原子的线性或支链烷基，或R1和R2与它们所连接的碳原子一起代表含有4到16个碳原子的桥环烃基，前提是烷基和桥环烃基可以具有至少一个选自以下一组的取代基：含有1到6个碳原子的线性或支链烷基（可以选择性地被取代）、羟基、羧基、含有2到6个碳原子的酰基、含有1到6个碳原子的烷氧基和含有1到6个碳原子的醇酯化的羧基。