(E)-styryl 4-methylbenzenesulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (E)-styryl 4-methylbenzenesulfonate
• 英文别名: styryl tosylate；[(E)-2-phenylethenyl] 4-methylbenzenesulfonate
• 化学式: C₁₅H₁₄O₃S
• 分子量: 274.34
• InChiKey: BYOQRNLPTNREPV-VAWYXSNFSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  51.8
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  N-甲基苯胺 、 (E)-styryl 4-methylbenzenesulfonate 在 氯化镍二甲氧基乙烷 、 tris(bipyridine)ruthenium(II) dichloride hexahydrate 、 caesium carbonate 、 4,4'-二叔丁基-2,2'-二吡啶 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 4.0h， 以37.5%的产率得到
  参考文献：
  名称：

  Coupling of C(sp³)–H bonds with C(sp²)–O electrophiles: mild, general and selective

  摘要：

  氨基/醚C(sp3)-H键与烯基/(杂)芳基C-O亲电试剂的普遍偶联反应报道了高选择性。

  DOI：

  10.1039/c6cc09685a
• 作为产物：
  描述：

  对甲苯磺酸 、 3-苯基丙-2-烯-1-醇 在 氯化锆(IV) 作用下， 以 二氯甲烷 为溶剂， 反应 6.5h， 以90%的产率得到(E)-styryl 4-methylbenzenesulfonate
  参考文献：
  名称：

  ZrCl4 作为醇与对甲苯磺酸选择性甲苯磺酰化的有效催化剂

  摘要：

  使用ZrCl 4 作为催化剂，在回流下在二氯甲烷中用对甲苯磺酸直接进行醇的甲苯磺酰化。发现伯醇比仲醇化学选择性地甲苯磺酰化。

  DOI：

  10.1246/cl.2004.1428

文献信息

• Preparation of α,β-unsaturated esters and amides via external-CO-free palladium-catalyzed carbonylation of alkenyl tosylates
  作者：Tsuyoshi Ueda、Hideyuki Konishi、Kei Manabe

  DOI：10.1016/j.tetlet.2012.07.057

  日期：2012.9

  monoxide nor any pressure-resistant apparatus. A variety of cyclic and acyclic alkenyl tosylates can be converted into the corresponding phenyl esters in good yields. Furthermore, this method is effective for the one-pot synthesis of α,β-unsaturated amides.

  描述了甲酸酯与甲酸苯酯的钯催化羰基化。该程序既不需要外部一氧化碳，也不需要任何耐压设备。各种环状和无环烯基甲苯磺酸盐可以良好的产率转化为相应的苯基酯。此外，该方法对于α，β-不饱和酰胺的一锅法合成是有效的。
• Palladium Catalyzed Alkoxy- and Aminocarbonylation of Vinyl Tosylates
  作者：Diana C. Reeves、Sonia Rodriguez、Heewon Lee、Nizar Haddad、Dhileepkumar Krishnamurthy、Chris H. Senanayake

  DOI：10.1021/ol200744s

  日期：2011.5.6

  The palladium catalyzed alkoxycarbonylation and aminocarbonylation of vinyl tosylates are described. A variety of ketone and aldehyde derived vinyl tosylates may be carbonylated in the presence of primary, secondary, and tertiary alcohols, or primary and secondary amines, to provide the corresponding esters and amides in good yields. The alkoxycarbonylation was applied to a short synthesis of isoguvacine

  描述了甲苯磺酸乙烯基酯的钯催化的烷氧基羰基化和氨基羰基化。在伯，仲和叔醇，或伯和仲胺的存在下，各种酮和醛衍生的乙烯基甲苯磺酸酯可以被羰基化，以高收率提供相应的酯和酰胺。将烷氧羰基化用于异古瓦汀的短合成。
• Polymerizable Fluorine-Containing Compound
  申请人：ISONO Yoshimi

  公开号：US20110098500A1

  公开（公告）日：2011-04-28

  A polymerizable fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  一种可聚合的含氟化合物，其化学式为（1），其中R1表示可聚合的双键含有基团，R2表示酸敏感保护基团，R3表示氟原子或含氟烷基团，W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并包含由式（2）表示的重复单元，其中R2、R3和W如上所述，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物，能够形成透明的曝光光线图案，并具有优异的矩形度。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20120226070A1

  公开（公告）日：2012-09-06

  A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

  化学式（1）所表示的含氟不饱和羧酸，其中R1代表可聚合的双键含基团，R3代表氟原子或含氟烷基团，W代表二价连接基团。该化合物可提供一种分子量为1,000-1,000,000且含有化学式（2）所表示的重复单元的含氟聚合物化合物，其中R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，R4、R5和R6中至少有两个可以结合形成环。该聚合物化合物可提供一种化学增强型光刻胶组合物，该组合物对KrF或ArF准分子激光光线透明，具有高分辨率，并能够形成具有矩形截面且无膨胀的图案。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20080311507A1

  公开（公告）日：2008-12-18

  Disclosed is a fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  本发明涉及一种含氟化合物，其化学式为（1），其中R1代表可聚合的双键含基团，R2代表酸易保护基，R3代表氟原子或含氟烷基团，W代表双价连结基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）所表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可以组成环。该聚合物化合物可提供一种抗蚀剂组合物，能够形成对曝光光线透明且在矩形度方面优越的图案。