Visible‐Light‐Promoted Oxidative Alkylarylation of
<i>N</i>
‐Aryl/Benzoyl Acrylamides Through Direct C−H Bond Functionalization
作者:Maojian Lu、Tao Zhang、Dabao Tan、Chengzhu Chen、Ying Zhang、Mingqiang Huang、Shunyou Cai
DOI:10.1002/adsc.201900712
日期:2019.9.17
N‐aryl/benzoyl acrylamides have been established through visible‐light‐enabled photocatalysis, furnishing a wide variety of functionalized oxindoles and isoquinolinediones in good‐to‐excellent yields under the synergistic interactions of an organic fluorophores‐type photocatalyst 4CzIPN, trifluoroacetoxyiodobenzene (PIFA), and 1,3,5‐trimethoxybenzene with visible light irradiation. The prominent features of this
Heterogeneous photocatalytic cyanomethylarylation of alkenes with acetonitrile: synthesis of diverse nitrogenous heterocyclic compounds
作者:Guanglong Pan、Qian Yang、Wentao Wang、Yurong Tang、Yunfei Cai
DOI:10.3762/bjoc.17.89
日期:——
photocatalytic cyanomethylarylation of alkenes with acetonitrile has been established using K-modified carbon nitride (CN-K) as a recyclable semiconductor photocatalyst. This protocol, employing readily accessible alkyl N-hydroxyphthalimide (NHPI) ester as a radical initiator, allows the efficient construction of a broad array of structural diverse nitrogenous heterocyclic compounds including indolines, oxindoles
使用 K 改性氮化碳(CN-K)作为可回收半导体光催化剂,建立了可见光介导的烯烃与乙腈的异相光催化氰甲基芳基化反应。该方案采用易于获得的烷基N-羟基邻苯二甲酰亚胺 (NHPI) 酯作为自由基引发剂,可以有效构建多种结构多样的含氮杂环化合物,包括二氢吲哚、羟吲哚、异喹啉酮和异喹啉二酮。
Fe-promoted radical cyanomethylation/arylation of arylacrylamides to access oxindoles via cleavage of the sp<sup>3</sup> C–H of acetonitrile and the sp<sup>2</sup> C–H of the phenyl group
作者:Changduo Pan、Honglin Zhang、Chengjian Zhu
DOI:10.1039/c4ob02172j
日期:——
Radical cyanomethylation/arylation of arylacrylamides to access oxindoles with acetonitrile as the radical precursor is described. This reaction involves dualC–H bond functionalization, including the sp3 C–H of acetonitrile and the sp2 C–H of the phenyl group. A variety of functional groups, such as methoxy, ethyloxy carbonyl, chloro, bromo, iodo, nitro, trifluoromethoxy and trifluoromethyl groups