二苯基二砜 | 10409-06-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 二苯基二砜
• 英文名称: diphenyl disulfone
• 英文别名: Diphenyl-disulfon；Phenyl-α-disulfon；diphenyldisulphone；1,2-diphenyl disulfone；benzenesulfonylsulfonylbenzene
• CAS: 10409-06-0
• 化学式: C₁₂H₁₀O₄S₂
• 分子量: 282.341
• InChiKey: CXJVMJWCNFOERL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  二苯基二砜 在 三乙基膦 作用下， 生成 二苯二硫醚
  参考文献：
  名称：

  Schaefer; zitiert bei Horner; Hoffmann, Angewandte Chemie, 1956, vol. 68, p. 473,480

  摘要：

  DOI：
• 作为产物：
  描述：

  苯亚磺酸 在 phosphate buffer 作用下， 以 水 为溶剂， 反应 0.4h， 以68%的产率得到二苯基二砜
  参考文献：
  名称：

  亚磺酸的电化学氧化：二芳基二砜的高效氧化合成

  摘要：

  Electrochemical oxidation of sulfinic acids has been studied in aqueous solutions using cyclic voltammetry, controlled-potential coulometry, chronoamperometry and chronocoulometry methods. The results indicate that the oxidation of sulfinic acids is an irreversible one-electron transfer process. Our data also show that the electrogenerated sulfonyl radicals undergo a dimerization reaction to form disulfone derivatives. The present work has led to the development of a facile and environmentally friendly electrochemical method for the synthesis of diphenyl disulfone derivatives. (C) 2017 The Electrochemical Society. All rights reserved.

  DOI：

  10.1149/2.1111706jes
• 作为试剂：
  描述：

  亚甲基环戊烷 在 二苯基二砜 作用下， 以 氘代氯仿 为溶剂， 反应 1.0h， 生成 1-甲基环戊烯
  参考文献：
  名称：

  二苯基二砜催化烯烃异构化的机理。化学选择性的起源：实验和量子化学研究

  摘要：

  聚砜和二苯基二砜催化的烯烃异构化对于 2-烷基-1-烯烃比线性末端烯烃快得多。这些反应的机理已经通过实验研究了亚甲基环戊烷异构化为 1-甲基环戊烯，理论上[CCSD(T)/6-311++G(d,p)//B3LYP/6-311++G(d ,p) 计算] 丙烯和 2-甲基丙烯与甲磺酰基自由基 MeSO2* 的反应。加热时，聚砜和 (PhSO2)2 与磺酰基 RSO2* 平衡。后者在一步过程中提取烯丙基氢原子，产生烯丙基自由基/RSO2H 对，这些对在溶剂笼内重组，产生相应的异构化烯烃和 RSO2*。亚磺酸 RSO2H 可以从溶剂笼中扩散出来（H/D 与 MeOD、D2O 交换）并还原烯丙基自由基。计算不支持其他可能的机制，例如烯烃之间的氢交换、电子转移或加成/消除过程。对 (PhSO2)2 催化的亚甲基环戊烷和氘代类似物的异构化测量的动力学氘同位素效应以及通过 CH3SO2* 从 2-甲基丙烯和氘代类似物的

  DOI：

  10.1021/ja0579210

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170073288A1

  公开（公告）日：2017-03-16

  The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.

  根据本发明，该化合物由特定的公式表示。根据本发明，该化合物具有特定公式的结构，因此可应用于湿法工艺，具有优异的耐热性和耐蚀性。此外，根据本发明，该化合物具有特定结构，因此具有高耐热性、相对较高的碳浓度、相对较低的氧浓度以及高溶剂溶解性。因此，根据本发明的化合物可用于形成在高温烘烤时降解受抑制且在氧等离子体蚀刻中具有优异耐蚀性的底层膜。此外，该化合物在与光阻层的粘附性方面也表现出色，因此可形成优异的光阻图案。
• Eine einfache und allgemeine Methode zur Herstellung von α-Disulfonen (R¹SO₂SO₂R²)
  作者：Ekkehard A. Bartmann

  DOI：10.1055/s-1993-25891

  日期：——

  A Facile and General Method for the Preparation of α-Disulfones (R1SO2SO2R2) Dialkyl, diaryl and alkyl aryl disulfones are easily prepared by oxidation of N,N′-disulfonylhydrazines with nitric acid. The method is compatible with a wide variety of substituents (R1,R2) on the sulfur atoms.

  一种简便通用的α-二砜制备方法 α-二砜（R1SO2SO2R2）的二烷基、二芳基及烷基芳基二砜可以通过硝酸氧化N,N′-二磺酰肼来轻松制备。该方法适用于硫原子上多种取代基（R1，R2）。
• Tunable and Practical Synthesis of Thiosulfonates and Disulfides from Sulfonyl Chlorides in the Presence of Tetrabutylammonium Iodide
  作者：Yong Zheng、Feng-Ling Qing、Yangen Huang、Xiu-Hua Xu

  DOI：10.1002/adsc.201600633

  日期：2016.11.3

  practical synthesis of electrophilic sulfenylating reagents, thiosulfonates and disulfides, from inexpensive and easily available sulfonyl chlorides, has been developed. By appropriate choice of solvents, the reaction of sulfonyl chlorides and tetrabutylammonium iodide gave the target products in good to excellent yields, respectively. These transformations probably proceed through a reducing–coupling

  已经开发了由廉价且容易获得的磺酰氯可调谐和实用地合成亲电子的亚磺酰化试剂，硫代磺酸盐和二硫化物。通过溶剂的适当选择，磺酰氯和碘化四丁基铵的反应，得到良好的目标产品，以优异的产率，分别。这些转变可能通过还原耦合途径进行。
• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。