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bis(2-acryloyloxyethyl) malonate

中文名称
——
中文别名
——
英文名称
bis(2-acryloyloxyethyl) malonate
英文别名
Bis(2-prop-2-enoyloxyethyl) propanedioate
bis(2-acryloyloxyethyl) malonate化学式
CAS
——
化学式
C13H16O8
mdl
——
分子量
300.265
InChiKey
GWGHVTLYKCWHCW-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.1
  • 重原子数:
    21
  • 可旋转键数:
    14
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.38
  • 拓扑面积:
    105
  • 氢给体数:
    0
  • 氢受体数:
    8

反应信息

  • 作为反应物:
    描述:
    bis(2-acryloyloxyethyl) malonate环戊二烯 在 zinc(II) chloride 作用下, 反应 24.0h, 以83%的产率得到bis[4-(bicyclo[2.2.1]hept-5-en-2-yl)-4-oxo-3-oxabutyl] malonate
    参考文献:
    名称:
    Synthesis and ring-opening metathesis polymerization of fullerene-containing α,ω-bis-norbornenes
    摘要:
    Metathesis polymerization of bis[4-(bicyclo[2.2.1]hept-5-en-2-yl)-4-oxo-3-oxabutyl]cyclopropa[1,9]-C-60-fullerene-3',3'-dicarboxylate affords insoluble polymer, while a copolymer with the parent malonate is soluble in typical organic solvents.
    DOI:
    10.1016/j.mencom.2015.05.014
  • 作为产物:
    参考文献:
    名称:
    Synthesis and ring-opening metathesis polymerization of fullerene-containing α,ω-bis-norbornenes
    摘要:
    Metathesis polymerization of bis[4-(bicyclo[2.2.1]hept-5-en-2-yl)-4-oxo-3-oxabutyl]cyclopropa[1,9]-C-60-fullerene-3',3'-dicarboxylate affords insoluble polymer, while a copolymer with the parent malonate is soluble in typical organic solvents.
    DOI:
    10.1016/j.mencom.2015.05.014
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文献信息

  • Photopolymerization initiator and photosensitive composition employing the same
    申请人:CANON KABUSHIKI KAISHA
    公开号:EP0353030B1
    公开(公告)日:1995-03-15
  • INK-JET INK COMPOSITION FOR ETCHING RESIST
    申请人:Sato Masaki
    公开号:US20110024392A1
    公开(公告)日:2011-02-03
    An ink composition for ink jet printing is provided which gives a cured object excellent in adhesion to metallic plates, resistance to etchants, and alkali removability and can be stably ejected with an ink jet apparatus. The ink jet composition for etching resists has a viscosity at 25° C. of 3-50 mPa s and includes monomers comprising: either a polymerizable phosphoric ester compound represented by general formula (I); a polyfunctional monomer having two or more ethylenic double-bond groups per molecule and having no phosphoric ester group, the content of the ethylenic double-bond groups being 4×10 −3 to 8×10 −3 mol/g; and a monofunctional monomer having one ethylenic double-bond group per molecule and having neither phosphoric ester group nor carboxy group. In the formula, X represents C 1-3 alkylene, Y represents C 2-3 alkylene, and R represents hydrogen or methyl.
  • RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME
    申请人:MASUYAMA Tatsuro
    公开号:US20120270154A1
    公开(公告)日:2012-10-25
    The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, A 2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A 1 represents a group represented by the formula (a-g1): A 10 -X 10  s A 11 -  (a-g1) wherein A 10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A 11 represents a C1-C5 aliphatic hydrocarbon group, X 10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.
  • US5124235A
    申请人:——
    公开号:US5124235A
    公开(公告)日:1992-06-23
  • US6011119A
    申请人:——
    公开号:US6011119A
    公开(公告)日:2000-01-04
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