Arylation of Diorganochalcogen Compounds with Diaryliodonium Triflates: Metal Catalysts Are Unnecessary
作者:Léanne Racicot、Takahito Kasahara、Marco A. Ciufolini
DOI:10.1021/ol503177q
日期:2014.12.19
Diaryliodonium triflates transfer an aryl group to the chalcogen atom of organic sulfides, selenides, and tellurides (but not ethers), in the absence of transition-metal catalyst, simply upon heating in chloroform or dichloroethane solution.
US6664022B1
申请人:——
公开号:US6664022B1
公开(公告)日:2003-12-16
[EN] PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME<br/>[FR] GENERATEURS DE PHOTOACIDES ET PHOTORESINES COMPRENANT CEUX-CI
申请人:SHIPLEY CO LLC
公开号:WO2002019033A2
公开(公告)日:2002-03-07
New photoacid generator compounds ('PAGs') are provided and photoresist compositions that comprise such compounds. In particular, ionic PAGs are provided that include tri-naphthyl sulfonium, thienyl iodonium, thienyl sulfonium, pentafluorophenyl iodonium and pentafluorophenyl sulfonium compounds. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as sub-300 nm, sub-200 nm and sub-160 nm such as 248 nm, 193 nm and 157 nm.
Photoacid generators and photoresists comprising same
申请人:Shipley Company, L.L.C.
公开号:US06664022B1
公开(公告)日:2003-12-16
New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, ionic PAGs are provided that include tri-naphthyl sulfonium, thienyl iodonium, thienyl sulfonium, pentafluorophenyl iodonium and pentafluorophenyl sulfonium compounds. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as sub-300 nm, sub-200 nm and sub-160 nm such as 248 nm, 193 nm and 157 nm.