申请人:Merck Patent GmbH
公开号:US11366392B2
公开(公告)日:2022-06-21
The present invention relates to a composition consisting essentially of an alkylbenzenesulfonic acid having structure (I) (wherein n is an integer from 0 to 16); a solvent which is either selected from the group consisting of solvents having structures (II), (wherein R is selected from the group consisting of —(—O—CH2—CH2—)n—OH, —OH, —O—C(═O)—CH3, wherein n′ is equal to 1, 2, 3, or 4), a solvent having structure (III), a solvent having structure (IV), and a solvent having structure (V), or a solvent mixture, of at least two solvents selected from this group. In another embodiment, the composition also consists of, additionally, a surfactant component. This invention also relates to using either of these compositions to remove a patterned photoresist from a substrate.
本发明涉及一种组合物,其主要成分为具有结构(I)的烷基苯磺酸(其中 n 为 0 至 16 的整数);溶剂,该溶剂可以选自具有结构(II)的溶剂(其中R选自-(-O-CH2-CH2-)n-OH、-OH、-O-C(═O)-CH3组成的组,其中n′等于1、2、3或4)、具有结构(III)的溶剂、具有结构(IV)的溶剂和具有结构(V)的溶剂,或至少两种选自该组的溶剂混合物。在另一个实施方案中,组合物还包括表面活性剂成分。本发明还涉及使用这些组合物中的任一种从基底上去除图案化光阻。