trimethoxymethylsilane

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: trimethoxymethylsilane
• 英文别名: Trimethoxymethyl silane
• 化学式: C₄H₁₂O₃Si
• 分子量: 136.223
• InChiKey: TUQLLQQWSNWKCF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.1
• 重原子数：
  8
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  27.7
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  trimethoxymethylsilane 在 sodium hydroxide 作用下， 以 氘代四氢呋喃 为溶剂， 反应 12.0h， 以73%的产率得到sodium;dimethoxy-methyl-oxidosilane
  参考文献：
  名称：

  Insights into the Hydrolytic Polymerization of Trimethoxymethylsilane. Crystal Structure of (MeO)₂MeSiONa

  摘要：

  The commercially practiced conversion of trimethoxymethylsilane (MTM) to [OSi(OMe)Me)](n) polymers and resins is assumed to proceed via the silanol (MeO)(2)MeSiOH. Access to this crucial silanol is gained via the synthesis of (MeO)(2)MeSiONa, the first methoxysilanoate to be crystallographically characterized. Mild protonation of this silanoate gives (MeO)(2)MeSiOH, which is shown to condense with (MeO)(2)MeSiOH but not with MTM. Condensation generates reactive disiloxanols but does not produce symmetric disiloxanes. Parallel results were obtained with (MeO)(2)PhSiOH.

  DOI：

  10.1021/acs.inorgchem.6b00874

文献信息

• Reversible C(sp³)-Si Oxidative Addition of Unsupported Organosilanes: Effects of Silicon Substituents on Kinetics and Thermodynamics
  作者：Scott M. Chapp、Nathan D. Schley

  DOI：10.1021/jacs.1c01564

  日期：2021.4.14

  addition is found to be completely reversible, with the product of reductive elimination being subject to trapping by triethylsilane. The successful isolation of these metal silyl complexes has allowed for an in-depth kinetic analysis of C(sp3)-Si reductive elimination, a process with strong implications in both catalytic C–H silylation and olefin hydrosilylation. The apparent order of reactivity is

  据报道在阳离子钳支撑的铱络合物上有机硅烷家族的分子间氧化未活化的C（sp 3）-Si键。据我们所知，以前没有报道过氧化加成以产生类似的未负载的（烷基）金属甲硅烷基络合物的例子。该转化的通用性极好，已证明了四有机硅烷，单和聚烷氧基硅烷以及两种甲硅烷氧基硅烷的成功实例。发现氧化加成是完全可逆的，还原消除的产物易被三乙基硅烷截留。这些金属甲硅烷基络合物的成功分离已允许对C（sp 3）-Si还原消除，此过程在催化C–H甲硅烷基化和烯烃氢化硅烷化中均具有重要意义。反应性的表观顺序为SiMe 3 > SiMe 2（CF 3）> SiMe 2 OSiMe 3 > SiMe 2 OSiMe 2 OSiMe 3 > SiMe 2（OMe）> SiMe 2（OEt）> SiMe（OMe）2。对氧化加成产物的DFT分析表明，（烷基）金属甲硅烷基络合物的热力学稳定性在约200℃的范围内。10 kcal·mol –1，与实验确定的C（sp
• Substrate, method for producing the same, and patterning process using the same
  申请人：Ogihara Tsutomu

  公开号：US20070128886A1

  公开（公告）日：2007-06-07

  There is disclosed a substrate comprising at least an organic film, an antireflection silicone resin film over the organic film, and a photoresist film over the antireflection silicone resin film, wherein the antireflection silicone resin film includes a lower silicone resin film and an upper silicone resin film which has lower silicon content than the lower silicone resin film. There can be provided a substrate comprising at least an organic film, an antireflection silicone resin film over the organic film, and a photoresist film over the antireflection silicone resin film, in which the antireflection silicone resin film has both excellent resist compatibility and high etching resistance at the time of etching the organic film, whereby a pattern can be formed with higher precision.

  本发明公开了一种基板，其包括至少一层有机膜、覆盖在有机膜上的抗反射硅树脂膜以及覆盖在抗反射硅树脂膜上的光刻胶膜，其中抗反射硅树脂膜包括下层硅树脂膜和具有比下层硅树脂膜更低硅含量的上层硅树脂膜。本发明还提供了一种基板，其包括至少一层有机膜、覆盖在有机膜上的抗反射硅树脂膜以及覆盖在抗反射硅树脂膜上的光刻胶膜，其中抗反射硅树脂膜具有优异的抗蚀性和高蚀刻有机膜时的蚀刻兼容性，从而可以形成更高精度的图案。
• Substrate comprising a lower silicone resin film and an upper silicone resin film
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US07868407B2

  公开（公告）日：2011-01-11

  There is disclosed a substrate comprising at least an organic film, an antireflection silicone resin film over the organic film, and a photoresist film over the antireflection silicone resin film, wherein the antireflection silicone resin film includes a lower silicone resin film and an upper silicone resin film which has lower silicon content than the lower silicone resin film. There can be provided a substrate comprising at least an organic film, an antireflection silicone resin film over the organic film, and a photoresist film over the antireflection silicone resin film, in which the antireflection silicone resin film has both excellent resist compatibility and high etching resistance at the time of etching the organic film, whereby a pattern can be formed with higher precision.

  本发明涉及一种衬底，该衬底包括至少一层有机膜、位于有机膜上方的抗反射硅树脂膜以及位于抗反射硅树脂膜上方的光阻膜。其中，抗反射硅树脂膜包括下层硅树脂膜和具有低于下层硅树脂膜硅含量的上层硅树脂膜。本发明还提供了一种衬底，该衬底包括至少一层有机膜、位于有机膜上方的抗反射硅树脂膜以及位于抗反射硅树脂膜上方的光阻膜。其中，抗反射硅树脂膜具有优异的抗蚀兼容性和高蚀刻有机膜时的耐蚀性，从而可以形成更高精度的图案。
• (METH)ALLYLSILANE COMPOUND, SILANE COUPLING AGENT THEREOF, AND FUNCTIONAL MATERIAL USING THE SAME
  申请人：Shimada Toyoshi

  公开号：US20140200311A1

  公开（公告）日：2014-07-17

  A (meth)allylsilane compound that a functional group of a (meth)allylsilyl group or a halogenosilyl group bonded to the (meth)allylsilyl group via a spacer group is bonded directly or through a divergent spacer group to a dehydrogenated residue of an amino group of an amino group-containing compound; a carbaminic acid ester group or an amide group derived from a dehydrogenated residue of the amino group; an aromatic compound; a polymerizable unsaturated groups; perfluoro group; a dehydrogenated residue of saccharide or a carbohydrate polyol (excluding when the divergent spacer group is an alkylene group, or an alkylene group and an arylene group); a dehydrogenated residue of an amino acid; a halogenosilyl group; or a substituted silyl group in which a halogen of the halogenosilyl group is substituted.

  一种(meth)allylsilane化合物，其中一个(meth)allylsilyl基团或卤代silyl基团通过间隔基团直接或通过分散的间隔基团与含氨基化合物的氨基残基的脱氢残基；一个由氨基残基脱氢得到的氨基酸酯基团或酰胺基团；一个芳香化合物；一个可聚合的不饱和基团；全氟基团；糖或碳水化合物多元醇的脱氢残基（当分散的间隔基团是一个烷基或一个烷基和一个芳基时除外）；一个氨基酸的脱氢残基；一个卤代silyl基团；或卤代silyl基团的卤素被取代的取代silyl基团上的官能团，与(meth)allylsilyl基团键合。
• (Meth)allylsilane compound, silane coupling agent thereof, and functional material using the same
  申请人：Shimada Toyoshi

  公开号：US09228107B2

  公开（公告）日：2016-01-05

  A (meth)allylsilane compound that a functional group of a (meth)allylsilyl group or a halogenosilyl group bonded to the (meth)allylsilyl group via a spacer group is bonded directly or through a divergent spacer group to a dehydrogenated residue of an amino group of an amino group-containing compound; a carbaminic acid ester group or an amide group derived from a dehydrogenated residue of the amino group; an aromatic compound; a polymerizable unsaturated groups; perfluoro group; a dehydrogenated residue of saccharide or a carbohydrate polyol (excluding when the divergent spacer group is an alkylene group, or an alkylene group and an arylene group); a dehydrogenated residue of an amino acid; a halogenosilyl group; or a substituted silyl group in which a halogen of the halogenosilyl group is substituted.

  一种（甲基）烯丙基硅烷化合物，其中一个（甲基）烯丙基硅基团或卤代硅基团通过一个间隔基团直接或通过一个分支间隔基团与含氨基化合物的氨基残基的脱氢残基结合；一种由氨基残基的脱氢残基衍生的氨基甲酸酯基团或酰胺基团；芳香族化合物；可聚合不饱和基团；全氟基团；糖或碳水化合物多元醇的脱氢残基（当分支间隔基团为烷基或烷基和芳基时除外）；氨基酸的脱氢残基；卤代硅基团；或卤素被取代的卤代硅基团中的取代硅基团。