RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
申请人:Watanabe Takeru
公开号:US20110195362A1
公开(公告)日:2011-08-11
There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
ONE-STEP FLOW-MEDIATED SYNTHESIS OF CANNABIDIOL (CBD) AND DERIVATIVES
申请人:TRUSTEES OF BOSTON UNIVERSITY
公开号:US20210163387A1
公开(公告)日:2021-06-03
Herein are described apparatus and processes for the preparation of cannabinoids, such as cannabidiol (CBD) and derivatives thereof. The apparatus and processes described can be used for the one-step, flow-mediated synthesis of cannabidiol and derivatives with improved overall yield, material throughput, and product purity relative to batch processes.
US8835092B2
申请人:——
公开号:US8835092B2
公开(公告)日:2014-09-16
Dezi, Emanuela; Lombardozzi, Antonietta; Renzi, Gabriele, Chemistry - A European Journal, 1996, vol. 2, # 3, p. 323 - 334