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3-methoxy-3-methyl-1-cyclohexene

中文名称
——
中文别名
——
英文名称
3-methoxy-3-methyl-1-cyclohexene
英文别名
3-Methoxy-3-methylcyclohexene
3-methoxy-3-methyl-1-cyclohexene化学式
CAS
——
化学式
C8H14O
mdl
——
分子量
126.199
InChiKey
HOBCIYRCWDRTLV-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.7
  • 重原子数:
    9
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.75
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    1

反应信息

  • 作为产物:
    描述:
    3-甲基-2-环己烯-1-醇氟甲烷三甲胺 作用下, 以293%的产率得到1-甲氧基-3-甲基-2-环己烯
    参考文献:
    名称:
    Dezi, Emanuela; Lombardozzi, Antonietta; Renzi, Gabriele, Chemistry - A European Journal, 1996, vol. 2, # 3, p. 323 - 334
    摘要:
    DOI:
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文献信息

  • RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
    申请人:Watanabe Takeru
    公开号:US20110195362A1
    公开(公告)日:2011-08-11
    There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
  • ONE-STEP FLOW-MEDIATED SYNTHESIS OF CANNABIDIOL (CBD) AND DERIVATIVES
    申请人:TRUSTEES OF BOSTON UNIVERSITY
    公开号:US20210163387A1
    公开(公告)日:2021-06-03
    Herein are described apparatus and processes for the preparation of cannabinoids, such as cannabidiol (CBD) and derivatives thereof. The apparatus and processes described can be used for the one-step, flow-mediated synthesis of cannabidiol and derivatives with improved overall yield, material throughput, and product purity relative to batch processes.
  • US8835092B2
    申请人:——
    公开号:US8835092B2
    公开(公告)日:2014-09-16
  • Dezi, Emanuela; Lombardozzi, Antonietta; Renzi, Gabriele, Chemistry - A European Journal, 1996, vol. 2, # 3, p. 323 - 334
    作者:Dezi, Emanuela、Lombardozzi, Antonietta、Renzi, Gabriele、Pizzabiocca, Adriano、Speranza, Maurizio
    DOI:——
    日期:——
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