(2E)-3-[4-氯-2-(甲基磺酰基)苯基]丙烯酸 | 849035-82-1

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 肉桂酸及其衍生物
• 中文名称: (2E)-3-[4-氯-2-(甲基磺酰基)苯基]丙烯酸
• 英文名称: (2e)-3-[4-Chloro-2-(methylsulfonyl)phenyl]-acrylic acid
• 英文别名: (E)-3-(4-chloro-2-methylsulfonylphenyl)prop-2-enoic acid
• CAS: 849035-82-1
• 化学式: C₁₀H₉ClO₄S
• mdl: MFCD04037952
• 分子量: 260.69
• InChiKey: MIPMROMSCSKIEH-HWKANZROSA-N

物化性质

• 熔点：
  251～253℃

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  79.8
• 氢给体数：
  1
• 氢受体数：
  4

安全信息

• 海关编码：
  2916399090

文献信息

• RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045820A1

  公开（公告）日：2017-02-16

  A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
• US9910354B2
  申请人：——

  公开号：US9910354B2

  公开（公告）日：2018-03-06