申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04487927A1
公开(公告)日:1984-12-11
This invention relates to novel 7-acylamino-3-vinylcephalosporanic acid derivatives of high antimicrobial activity, to processes for preparation thereof from novel intermediates, and to said intermediates of the formula: ##STR1## in which R.sub.A is a group of the formula: ##STR2## wherein R.sup.1 is amino-substituted-heterocyclic group which may have halogen, protected amino-substituted-heterocyclic group which may have halogen, or a group of the formula: ##STR3## wherein R.sup.3 is lower alkyl, R.sup.8 is aryl, A is lower alkylene which may have a substituent selected from the group consisting of amino, a protected amino group, hydroxy, oxo and a group of the formula: .dbd.N.about.OR.sup.4, wherein R.sup.4 is hydrogen, cyclo(lower)alkenyl, lower alkynyl, lower alkenyl, lower alkenyl substituted by carboxy or a protected carboxy group, lower alkyl, or lower alkyl substituted by one or more substituent(s) selected from carboxy, a protected carboxy group, amino, a protected amino group, cyano, phosphono, a protected phosphono group and a heterocyclic group which may have suitable substituent(s), R.sup.a is a protected amino group, R.sup.b is a protected carboxy group, R.sub.B is a group of the formula: --CH.sub.2 --X.sup.2, --CH.sub.2 P.sup..sym. (R.sup.7).sub.3 .multidot.X.sup.3.crclbar. or --CH.dbd.P(R.sup.7).sub.3 wherein R.sup.7 is aryl, and X.sup.2 and X.sup.3 are each halogen, and R.sup.2 is carboxy or a protected carboxy group, provided that, when R.sub.A is a group of the formula: R.sup.8 --CH.dbd.N--, wherein R.sup.8 is as defined above, then R.sub.B is a group of the formula: --CH.sub.2 P.sup..sym. (R.sup.7).sub.3 .multidot.X.sup.3.crclbar. or --CH.dbd.P(R.sup.7).sub.3, wherein R.sup.7 and X.sup.3 are each as defined above, or a salt thereof.
这项发明涉及具有高抗菌活性的新型7-酰氨基-3-乙烯头霉素酸衍生物,以及从新型中间体制备它们的方法,以及所述的具有以下结构的中间体:##STR1## 其中R.sub.A是以下结构的基团:##STR2## 其中R.sup.1是氨基取代的杂环基团,可能具有卤素,受保护的氨基取代的杂环基团,可能具有卤素,或者以下结构的基团:##STR3## 其中R.sup.3是较低的烷基,R.sup.8是芳基,A是可能具有来自氨基、受保护的氨基基团、羟基、氧代或以下结构的取代基团的取代基团的较低烷基,其中R.sup.4是氢、环(较低)烯基、较低炔基、较低烯基、较低烯基取代的羧基或受保护的羧基、较低烷基,或者较低烷基取代的一个或多个取代基团,所述取代基团选自羧基、受保护的羧基、氨基、受保护的氨基基团、氰基、磷酸基、受保护的磷酸基团和可能具有适当取代基团的杂环基团,R.sup.a是受保护的氨基基团,R.sup.b是受保护的羧基团,R.sub.B是以下结构的基团:--CH.sub.2 --X.sup.2、--CH.sub.2 P.sup..sym. (R.sup.7).sub.3 .multidot.X.sup.3.crclbar.或--CH.dbd.P(R.sup.7).sub.3,其中R.sup.7是芳基,X.sup.2和X.sup.3分别是卤素,R.sup.2是羧基或受保护的羧基团,但是当R.sub.A是以下结构的基团时:R.sup.8 --CH.dbd.N--,其中R.sup.8如上定义,那么R.sub.B是以下结构的基团:--CH.sub.2 P.sup..sym. (R.sup.7).sub.3 .multidot.X.sup.3.crclbar.或--CH.dbd.P(R.sup.7).sub.3,其中R.sup.7和X.sup.3如上定义,或其盐。