[DE] ALICYCLISCHE ESTER MIT MOSCHUSGERUCH<br/>[EN] ALICYCLIC ESTER WITH MUSK FRAGRANCE<br/>[FR] ESTER ALICYCLIQUE SENTANT LE MUSC
申请人:SYMRISE GMBH & CO KG
公开号:WO2005012222A1
公开(公告)日:2005-02-10
Beschrieben wird eine Verbindung der Formel (I) oder (II) wobei in den Formeln (I) und (II) R1 eine gegebenenfalls substituierte (a) verzweigte oder unverzweigte C1 bis C5 Alkylgruppe oder (b) verzweigte oder unverzweigte C2 bis C5 Alkylengruppe oder (c) C3 bis C5 Cycloalkylgruppe ist und in Formel (II) die gestrichelt dargestellte Bindung eine Einfach- oder Doppelbindung bedeutet.
The compounds represented by the structural formula ##STR1## wherein A, B and C each independently represent hydrogen or lower alkyl having from 1 to 4 carbon atoms, provided that the sum of the carbon atoms in A, B and C is no more than 5, R.sup.1 represents alkyl having from 1 to 4 carbons, have been found to be particularly useful in compositions and methods for counteracting malodors. Novel compounds are also disclosed.
The invention relates to novel alicyclic esters, methods for the their preparation, their use as fragrances and also perfumed products and fragrance mixtures containing the compounds according to the invention.
Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
申请人:Mori Kazunori
公开号:US20120077126A1
公开(公告)日:2012-03-29
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle.
In the formula, R
1
represents a polymerizable double bond-containing group; R
2
represents a fluorine atom or a fluorine-containing alkyl group; R
8
represents a substituted or unsubstituted alkyl group or the like; and W
1
represents a single bond, a substituted or unsubstituted methylene group or the like.
POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
申请人:Masunaga Keiichi
公开号:US20110212391A1
公开(公告)日:2011-09-01
A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.